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New Test Facilities at Argonne

This collaboration meeting highlights the current status, next steps, and new facility at Argonne APS Sector 7 for testing MCP/Photocathode assemblies. It discusses the use of a Ti:Sapphire Femto-second laser for precise measurements of optical/electronic characteristics, as well as advancements in MCP chemistry, photon counting, image profiling, and more. Achievements include the development of a working characterization system and enhanced amplification with ALD coating on commercial MCPs.

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New Test Facilities at Argonne

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  1. New Test Facilities at Argonne LAPPD Collaboration meeting June 10 2010 Matt Wetstein, Bernhard Adams, Matthieu Chollet

  2. Sector 7 beamline at the APS • Current status of MCP testing • Next step • New facility

  3. APS Sector 7 E C D B A Ti:Sapphire Femto-second Laser 800 nm (near infrared) 2.5W average output power 1 or 5 KHz repetition rate 55 fs pulses

  4. measures the optical and electronic characteristics of MCP/Photocathode/striplineassemblies simultaneously with precision timing and gain in realistic operating conditions. •Working with ALD functionalized MCP’s •Working with stripline anode structure similar to final product • Understand what MCP chemistry work •Photon counting, pulse height distributions, amplification curves •Image profile, position resolution, signal shape, uniformity •I/V curves, dark current, technical issues • Advanced Characterization in the time domain •Transit time spread, arrival time, first strike problem • Full sized testing

  5. Test setup:

  6. Laser setup: Test Chamber BBO crystals Flip mirror 800, 400nm rejection mirrors UV LED Reference Diode

  7. Achievements: • A working characterization system built from scratch. • Developed methodology for UV-LED and laser based MCP Measurements • Demonstration of enhanced amplification with high SEE ALD coating on • commercial MCP. • First measurements of a working Argonne MCP pair. • Stronger collaboration with fabrication, simulation, and testing groups. • Faster turn-around and feedback.

  8. Next step: B-Flange Status: We have: Flange Adaptor flange to fit current chamber parts for 2-3 complete MCP sample holders Automation: Voltage scan/data acquisition script WIENER power supply...ordered (not sure of lead time...) Large Chamber What we critically need: Photocathode (being built) Fixtures to attach sample holder to B flange (being ordered) spacers to apply bias voltages across inter-MCP gap and PC gap (need to finish design and have built) A way to take the adapted B flange on and off the small chamber (rubber gasket) signal board with parallel connectors (being built) Hoping to ramp this us in the next few weeks…

  9. Parasitic use of the beamline laser 3 months experiments Laser available only during 1 month shutdown time E D C

  10. New laser room: Class 3B Laser: 800nm <1w average output power 50 fs pulse @ 1 KHz

  11. Double pulse excitation: Relaxation time measurement l/4 l/4 Equivalent circuit of a pore IR UV MCP

  12. Conclusion Methodology for MCP characterization Automated measurements is on the way. Database to keep track of samples and test results Update of test setup with B-flange Ready the big chamber for real size test

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