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Fabrication techniques (only very brief overview)

Fabrication techniques (only very brief overview). Planar waveguides Deposited thin films sputtering deposition from solutions polymerization CVD Diffusion Ion exchange Ion implantation Carrier removal Epitaxial growth 3D Waveguides Optical fibers. monolitické OIC.

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Fabrication techniques (only very brief overview)

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  1. Fabrication techniques(only very brief overview) • Planar waveguides • Deposited thin films • sputtering • deposition from solutions • polymerization • CVD • Diffusion • Ion exchange • Ion implantation • Carrier removal • Epitaxial growth • 3D Waveguides • Optical fibers

  2. monolitické OIC α ~ 2 dB/cm (vlnovod) (GaInAsP 1.3/1.55 μm - „telekomunikační“ vlnové délky) jen hybridní OIC α < 0.3 dB/cm (vlnovod)

  3. Planar waveguides

  4. Sputtering e.g.plasma discharge vacuum (2-20).10-3 torr inert gas glass, KDP, Si...

  5. Sputtering e.g. ion bean sputtering system

  6. Deposition from solutions

  7. Diffusion Ti film

  8. Ion exchange

  9. Ion exchange ~300°

  10. Carrier removal • free carriers reduce the index of refraction • the cut-off condition is independent of wavelength GaAs, GaP

  11. annealing

  12. Epitaxial growth • fabrication of monolitic optical io formed on a semiconductor substrate • required bangap:

  13. Molecular beam epitaxy (MBE) e.g.GaAlAsorGaInAsP

  14. 3D waveguides

  15. Waveguide gratings

  16. Optical fibers CVD:

  17. 1st step: preform fabrication using MCVD SiCl4 + O2 dopants

  18. 2nd step: fiber drawing

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