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Introduction

Introduction. An Introduction to the Hiden EQP. www.HidenAnalytical.com. Plasma Processes. Plasma Processes. Factor Affecting Plasma Constituents. Factors Affecting Plasma Constituents. Complex System To Predict. What can the EQP do for you?. What can the EQP do for you ?.

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Introduction

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  1. Introduction An Introduction to the Hiden EQP www.HidenAnalytical.com

  2. Plasma Processes Plasma Processes

  3. Factor Affecting Plasma Constituents Factors Affecting Plasma Constituents Complex System To Predict

  4. What can the EQP do for you? What can the EQP do for you ? The Hiden EQP is a combined Mass / Energy analyser for the analysis of IONS, NEUTRALS, and RADICALS from plasma processes The Hiden EQP system comprises: • Ion extraction optics • Ioniser • Sector field energy analyser • Triple filter mass analyser • Pulse ion counting detector • PC data system with Windows software

  5. The Hiden EQP. Orifice Extractor Lens 1 Filaments F1, F2, e- Energy Source cage ENERGY ANALYSER Axis Lens 2 QUADRUPOLE Quad, Vert, Horiz Axis Focus Suppressor Pumping 1st Dynode Collector

  6. The Hiden EQP The Hiden EQP. Laser Drilled Orifice • User defined dimension from 30 m • +ve / -ve ions, neutrals or radicals • Pre-thinned for optimum sampling • Software control for minimum plasma effects • Plasma electrode coupling option – allows the user to configure the orifice to exactly follow electrode conditions during operation.

  7. The Hiden EQP The Hiden EQP. Extractor / Lens Assembly • Software controlled extraction / Focus • Discriminates +ve, -ve, e-, radicals • Fully tuneable for optimal detection • Integrated ionisation source

  8. The Hiden EQP The Hiden EQP 45° Electrostatic Sector Analyser • Optimum transmission cf. Bessel box • Minimum perturbation of ion flight path • Constant ion transmission at all energies • Energy resolution down to 0.25 eV FWHM • Energy scan at increments from 0.05 eV • Floating option up to 10 KeV

  9. The Hiden EQP The Hiden EQP. Triple Filter Quadrupole • Discrete ioniser as standard • RF only pre / post filters • Minimises effects of fringe fields • Enhanced peak separation / transmission • Detection to 5 PPB • Enhanced long term stability • Enhanced contamination resistance • Full source control, e- attachment option

  10. The Hiden EQP The Hiden EQP. Channeltron PIC • 7 decades continuous dynamic range • 24 bit counter for 1c /s resolution • Faraday Cup for high density plasmas • Signal gating with 1 s resolution – • energy & mass distributions vs time • TTL / DDE data export options

  11. EQP Options EQP Options • 2500 amu option for polymer and cluster studies • Gating input for pulsed plasma applications • Positive and negative ion capability • Etching or deposition studies

  12. EQP Options EQP Options. EQP with RF driven electrode 2500 amu EQP with z drive

  13. The Hiden EQP may be configured for: The Hiden EQP may be configured for: • Analysis through a --- viewport --- grounded electrode • --- driven electrode • High pressure plasmas with double differential pumping • Magnetically confined plasmas with Mu-metal & radio-metal shielding • Analysis of high mass (1000 amu) • Analysis of high energy (1000 eV)

  14. Example Data Example Data EQP measuring every 20 ms C+ at ~20ppb 100 ppb

  15. Electron Energy Spectra Electron Energy Spectra The data compares the appearance potentials for the principle cluster ions formed from Buckminsterfullerene

  16. Negative Ions/Ion Energy Distribution Negative Ions / Ion Energy Distributions The data show the presence of O- formed from e-+ CO2  O-+ … Discrete paths at e- energies of 70, 8.5 and 4.2 eV. The ion energy distribution of these species is seen to be a function of the electron energy involved.

  17. Energy Analysis of Plasma Components SF+ Energy V SF2+ SF3+ Energy V Energy V Energy Analysis of Plasma Components F+ ions Energy V • Even in an apparently homogeneous plasma the individual component species can exhibit a wide variation in energies.

  18. Examination of Plasma-Specific Processes Examination of Plasma-Specific Processes H-/CH4 Plasma Off e- + H2 = H- H-/CH4 Plasma On • The plasma produces activated species as well as electrons. • These species can interact and react in highly specific fashion e.g. hydride anion formation.

  19. Electron Attachment Analysis Electron Attachment Analysis • O- species may be formed from various precursors e.g. CO, CO2, N2O via electron attachment and subsequent dissociation. However the low energy resonant electrons required for this process are characteristic of the precursor involved.

  20. Also available Also available: Langmuir Plasma Probes. • RF compensated Langmuir Probe with Z-drive • Automatic analysis with real time trend display of key plasma parameters including: • Ion Density • Plasma Potential • Electron Energy • Debye Length

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