1 / 23

Vacuum Technology

Vacuum Technology. Vacuum Applications in Nanomanufacturing. Objectives To demonstrate the use of vacuum in manufacturing processes To quantify the need for vacuum conditions in each process To define the levels of vacuum present in the process

bui
Télécharger la présentation

Vacuum Technology

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. Vacuum Technology

  2. Vacuum Applications in Nanomanufacturing • Objectives • To demonstrate the use of vacuum in manufacturing processes • To quantify the need for vacuum conditions in each process • To define the levels of vacuum present in the process • To identify how these levels of vacuum are attained and measured

  3. Vacuum in Lithography Process • Objective of Process • Create temporary features on silicon wafer to guide etch and deposition processes • Role of Vacuum in Process • Electron Beam Lithography • Exclude atmospheric gases from lithography chamber to avoid particle collisions with beam and loss of energy • Eliminate secondary emission from particles that were inadvertently “struck” through increased MFP • Extremely high vacuum level required (10-7 to 10-9 T)

  4. Vacuum in Deposition Processes • Objective of Process • Add new layers or substances to a defined region of a silicon wafer • Physical Vapor Deposition • Sputtering • Evaporation • Chemical Vapor Deposition • LPCVD – Low Pressure Chemical Vapor Deposition • PECVD – Plasma Enhanced CVD

  5. Vacuum in Physical Deposition • Sputtering • A target anode material is hit by a high energy electron beam, dislodging atoms • Pressures of 5 – 10 mTorr • De-gas step at much higher vacuum (10-9 T) may be used to remove oxide from target and drive off contaminants (vacuum provides a clean environment) • Vacuum is also key to process as it minimizing gas phase collisions of particles being dislodged from target to wafer (Mean Free Path is larger)

  6. Vacuum in Physical Deposition • Thermal Evaporation • A material is heated to its melting point in a vacuum environment • Pressures of 10-2 Torr to begin • Minimizes oxide formation in metals • Inert gas at higher pressure (Ar) used to transport vapor phase element to location • Vacuum role is to remove contaminants and, with lower atmospheric pressure, to sustain evaporation.

  7. Vacuum in Chemical Deposition • Chemical vapor deposition • LPCVD • Low pressure CVD (0.1 – 1 Torr) • Deposits oxides nitrides, or polysilicon • Relatively high temperature process (>650 Deg C) • UHVCVD – Ultra high vacuum (10 -9T) • Extremely High vacuum eliminates contaminants from reaching surface • PECVD - Plasma Enhanced CVD • Gas plasma used to control deposition rate • Not possible to create a plasma at higher pressures due to mean free path being too short • Electrons cannot gain enough energy without collision

  8. Vacuum in The Etch Processes • Objective • Remove material from a defined region of a silicon wafer • Physical Etching • Sputtering – Similar to deposition, but the “target” is the wafer! Less common today, but a low pressure method (<50mTorr) • A purely physical process where ions from introduced gas in RF powered chamber bombard the surface

  9. Vacuum in Etch Process (2) • Plasma Etching • Vacuum is used to remove atmospheric gases • Low pressure etchant gas such as CF4 is introduced into chamber where RF stream is flowing • Gas breaks down into ions, electrons, and radicals • CF4 dissasociates into CF3 + and F radical, which attacks silicon causing etching(2)

  10. Vacuum in Ion Implantation • Ion Implantation • Used to create conductive species in silicon • Creates the source and drain areas for transistors and many other features • Ion beam of defined impurity is used • High Vacuum conditions are required to • Ensure that no contaminant species exists • Increase mean free path so no collisions in ion beam result

  11. Vacuum Environments • Creation of different vacuum levels requires different components • Pumping systems • Piping • Measuring vacuum levels accurately requires different techniques • Gauge types • Physical Processes

  12. Ranges of Vacuum

  13. Vacuum Levels and Pumps

  14. Pumps Gas Transfer Entrapment Cryogenic Cryosorption Sputter-Ion Sublimation Momentum Transfer Positive Displacement Rotary Pumps Fluid Entrainment Drag Vane Lobe Piston Dry pumps Diffusion Water Jet Vapor Jet Turbo Molecular Pump Categories

  15. Work Chamber N2 purge (vent) Rough Valve Ion Gauge (Hi Vac) Soft Start Valve Convectron Gauge (Rough line) Thermocouple Gauge (TC) (Rough Vac) Hi Vac Valve Cryo N2 rough line backfill TC Gauge Temperature Transducer Oil Trap Blower Purge Gas Valves Foreline Valve Exhaust Rotary Vane Heater Complete High Vacuum Work Chamber MATEC MODULE 101

  16. Pumpdown Sequence • All valves are initially CLOSED • Soft start valve OPENS • Chamber pumps down for 60 seconds • Soft start valve CLOSES • Rough Valve OPENS • Chamber pumps down to 100 mT • Rough Valve CLOSES • Hi Vac Valve OPENS • Ion Gauge turns ON • Chamber pumps down to base pressure • Process begins at operating pressure

  17. Pumpdown Sequence • Two different pump types are used • Rotary Vane type for rough vacuum • Rotary vane pump is a positive displacement pump • Prior to the rotary vane pump reaching its “ultimate pressure” (pressure at which its pumping speed goes to 0), the sequence shuts it off and the valve is closed to avoid backstreaming oil from the input. • Crossover pressure is where this takes place • Cryo pump for high vacuum • Cryo Pump is an entrapment type pump • Contaminant particles are captured on its inside walls through use of very low temperatures • Periodically Cryo pumps must be regenerated

  18. How Can We Measure Vacuum? • To ascertain the pressure level, gauges of different types are used • Direct gauges use pressure from the gas to deflect a needle or move a column of mercury or other liquid • Indirect gauges use principles of heat transfer or electrical changes that take place based on the number of gas molecules present • Both processes are gas type dependent

  19. Vacuum Gauges –Direct Type • Mechanical gauges such as the diaphragm gauge shown here are usable for rough vacuum. Pressure from the gas deflects the diaphragm

  20. Vacuum Gauges - Indirect • Indirect gauges such as the thermocouple gauge are usable for rough to medium vacuum levels where direct pressure is too low to mechanically deflect a gauge.

  21. Vacuum Gauges - Indirect • Ionization gauges are useful for high vacuum measurement. where direct pressure is too low to mechanically deflect a gauge.

  22. Typical Ranges of Gauges Source: MATEC Module 101

  23. references (1)http://www.pfonline.com/articles/069901.html (2) SS 11.26 Introduction to Semiconductor Manufacturing, Hong Xaio, Prentice Hall, Upper Saddle River, NJ C 2001 (3) MATEC Module 74 Narrative – Etch (4) MATEC Module 26 PowerPoint

More Related