G-HEXA RESEARCH CENTER PVT LTD

1. Low-kV FESEM & Graphene Imaging: Why Standard Microscopy is Destroying Your Nanosheets. If you work with 2D materials like Graphene, MoS2, or h-BN, you have likely faced this nightmare: You load your sample, turn on the beam, and watch your perfect monolayer tear apart, curl up, or vanish entirely. Why does this happen? Standard FESEM imaging often uses high voltages (10kV – 20kV). At these energies, the electron beam penetrates deep into the "bulk" of the substrate. For a material that is only one atom thick, this is like using a sledgehammer to crack a nut. You aren't just imaging the surface; you are knocking atoms out of the lattice (Knock-on Damage) and creating thermal stress. The Solution: Low-Landing Energy. To see the true surface morphology—the delicate wrinkles, the folding edges, the layer stacking—you need to operate in the 0.1kV to 1kV range.

2. At Ghexa Research Centre, we specialize in this "Gentle Imaging" technique. underneath. Surface Sensitivity: We capture the topography of the nanosheet, not the substrate samples. No Charging: Lower energy means less charge accumulation on non-conductive Zero Damage: Your sample comes out exactly as it went in. Don't let high voltage ruin your hard work. Partner with Us: Web: https://G-Hexa.com Email: info@g-hexa.com Phone: +91 72593 61109 #LowKVFESEM #GrapheneImaging #Nanotech #MaterialScience #Microscopy #2DMaterials #ResearchTips #GhexaResearch