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Advanced Ceramic Heater Technologies Aluminum Nitride ( AlN )

Advanced Ceramic Heater Technologies Aluminum Nitride ( AlN ). Thermal Solutions for Challenging Semiconductor Applications. Chemical Vapor Deposition Plasma Etch • Wafer Test. Multiple Heater Zones for Temperature Uniformity

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Advanced Ceramic Heater Technologies Aluminum Nitride ( AlN )

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  1. Advanced Ceramic Heater Technologies Aluminum Nitride (AlN) Thermal Solutions for Challenging Semiconductor Applications

  2. Chemical Vapor Deposition Plasma Etch • Wafer Test • Multiple Heater Zones for Temperature Uniformity • Integrated Tungsten RTD for Immediate Response to Temperature Change • High Resistance to Chemical Corrosion • Integrated RF Grid

  3. Semiconductor Thermal Solutions Crucible Heating • Complex 2 dimensional (2D) and 3 dimensional (3D) geometries • High Temperature Applications • Uniform Temperature Profile

  4. Co-Fired Aluminum Nitride Substrate • Low Coefficient of Thermal Expansion • Homogeneous Construction • Multi-Layer Construction

  5. Fluid Dispensing Application • Thermal conductivity: 190 W/mK • High Heat Capacity • Chemical Compatibility

  6. Semiconductor Thermal Solutions Gas and Fluid Heating • Smooth Non-Porous Surface Finish • Zoned Heater Circuits • High Electrical Dielectric • Chemical Compatibility

  7. Clinical Diagnostics PCR Thermal Cycler • Rapid Thermal Cycling • Vacuum Channels • Tungsten Metallization • Distributed Wattage on Edges

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