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Inorganic Phosphors and ACTFEL Devices on Flexible Plastic Substrates

Inorganic Phosphors and ACTFEL Devices on Flexible Plastic Substrates. J. P. Bender and J. F. Wager Department of Electrical Engineering and Computer Science http://ece.oregonstate.edu/matdev S. Park, B. L. Clark, and D. A. Keszler Department of Chemistry Oregon State University

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Inorganic Phosphors and ACTFEL Devices on Flexible Plastic Substrates

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  1. Inorganic Phosphorsand ACTFEL Devices on Flexible Plastic Substrates • J. P. Bender and J. F. Wager • Department of Electrical Engineering and Computer Science • http://ece.oregonstate.edu/matdev • S. Park, B. L. Clark, and D. A. Keszler • Department of Chemistry • Oregon State University • Corvallis, Oregon USA 97731-3211

  2. Organization • Hydrothermal annealing overview • Hydrothermally annealed Zn2GeO4 • Zn2GeO4:Mn on flexible plastic substrates • Conclusions

  3. Hydrothermal Annealing • Modification of conventional hydrothermal dehydration technique • Substrate is sealed in a Teflon-lined reaction vessel with water and heated • Material is repeatedly dissolved and redeposited, causing crystalline grain growth • Refractory oxide films crystallized using this technique include MnO2, ZrO2, Zn2SiO4, and Zn2GeO4

  4. Hydrothermal Annealing of rf Sputtered Zn2GeO4:Mn • Zn2GeO4:Mn ACTFEL devices with L40 > 100 nits @ 60 Hz and CIEx,y = 0.300,0.667 have been demonstrated • Hydrothermal annealing is possible due to small solubility of Zn2GeO4 in water

  5. Hydrothermally Annealed Zn2GeO4:Mn • Annealed film roughness can be controlled from Rq ~ 10 nm to ~ film thickness by adjusting anneal temperature, time, and amount of water added

  6. Hydrothermally Annealed Zn2GeO4:Mn • PL emission observed: • 125 °C for hydrothermal anneal • 625 °C for furnace anneal • Approximately equal PL intensity: • 200 °C, 2 hrs for hydrothermal anneal • 680 °C, 2 hrs for furnace anneal

  7. Zn2GeO4:Mn films on Plastic Substrates • Substrate requirements: • withstand 150 °C • withstand UV & O radicals • withstand exposure to H2O • retain dimensions and flexibility • Three plastics successfully employed: • polypropylene • Kapton polyimide • Appear 3000

  8. Kapton Polyimide • Tg > 360 °C • Chemically very stable • Relatively low CTE • Deep amber or black color • Dupont Kapton 500HPP-ST preferred for better thin-film adhesion

  9. Bright PL from Inorganic Phosphor on Flexible Substrate • Hydrothermally annealed Zn2GeO4:Mn film shows bright green photoluminescence • Polyimide film may be bent moderately without cracking or delamination of film

  10. Inverted ACTFEL Device ITO (320 nm) SiO2 (300 nm) Zn2GeO4:Mn (500 nm) Ti adhesion/contact (100 nm) Polyimide film (5 mils)

  11. Appear 3000 • Clear plastic film from Promerus designed for display applications • Less attractive than polyimide films in many respects, but: 92% transparent

  12. Normal ACTFEL Device Al (320 nm) Zn2GeO4:Mn (500 nm) SiO2 (300 nm) Ti adhesion (10 nm) ITO (160 nm) Ti adhesion (10 nm) Appear 3000 film (5 mils)

  13. Conclusions • Thin-films of crystalline refractory oxides have been deposited on flexible plastic substrates • Operational ACTFEL devices have been fabricated on flexible plastic, exhibiting dim EL • Further work is needed to improve performance: • Better low temperature dielectric • Improved performance from hydrothermally annealed Zn2GeO4:Mn • Investigation of hydrothermal annealing for other oxide phosphors

  14. Acknowledgements • This work was supported by the National Science Foundation under Contract Nos. DMR-0071899 and DMR-0071727. • Kellie Schmitt of DuPont, Joe McDaniel of Promerus, and Ivo Thys of AFGA provided plastic film samples for evaluation.

  15. Materials Properties

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