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This proposal outlines a novel approach to nano-fabrication utilizing advanced etching patterns (10 nm to 1 cm) on various metals including Au, Cu, and unique materials like ITO and SiO2. By manipulating geometry and materials at the nanoscale, we can enhance functionality in electronic applications, photonics, and energy technologies. This innovation is vital for humanity as it supports the development of more efficient and sustainable technologies. Projects will be conducted from November 20 to December 20, 2012, with submissions due by November 15, 2012.
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ano - Fast Fabrication (Proposal)* • Geometry and materials (my sample is:) • Why this sample is important for humanity? (short description of proposal and science behind) Pattern (resolution 10 nm – 1 cm) Etched out metal (Au, Cu, Ti, Cr, Al, Ag, Pd[! unique] ) ITO (indium tin oxide), SiO, ZnO, SiO2 Substrate (Si, cover glass, TiO2, diamond, what you bring ) * Submit this form (strictly 1 slide!) to SJuodkazis@swin.edu.au by Nov. 15, 2012 Projects will be carried out in Nov. 20 – Dec. 20, 2012