500 nm

1. Materials World Network: Triblock Terpolymers for Self-assembled NanolithographyCaroline A. Ross, Massachusetts Institute of Technology, DMR 1007760 This project explores how triblock terpolymers form thin films with a diverse range of geometries, with applications in nanolithography. Initial work used a polyisoprene-polystyrene-polyferrocenylsilane (PI-PS-PFS) which forms a square packed arrangement of PI and PFS cylinders. By functionalizing the substrate, we were able to dramatically increase the quality of ordering of the square array. Additionally, nanoscale posts or walls on the substrate effectively ordered the arrays, giving registration of the pattern to substrate features. left: templating using walls. right: using posts (bright white). PFS microdomains show as grey dots, and have a 44 nm period. J.G. Son et al., Nano Letts. (2011) 500 nm 300 nm

2. Materials World Network: Triblock Terpolymers for Self-assembled NanolithographyCaroline A. Ross, Massachusetts Institute of Technology, DMR 1007760 This Materials World Network project includes researchers from Bristol University in the UK. The groups spent time together on vists and at conferences, exchanging expertise on polymer processing and substrate templating, and collaborated on design of new polymers. Ross visited Bristol to give a talk, and introduced block copolymer nanolithography into classes on nanoscale processing. Collaborations went on with a group in MIT Electrical Engineering on template fabrication and another group in Mateirals Science on self consistent field theory modeling. Synthetic route developed at Bristol for triblock terpolymer