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Innovative Top-Down Technique for Fabricating Single Nanochannels with Uniform Widths

This paper presents a novel top-down method to fabricate single fluidic channels with uniform widths ranging from 11 to 50 nm, extending over 1.5 cm in length. The technique employs a unique imprint mold created through crystallographic anisotropic etching, allowing for precise nanoimprint patterning in functional material layers. The process includes optical RIE for transferring patterns onto substrates, ensuring atomically smooth sidewalls and uniform channel widths. Results demonstrate sub-10 nm lithographic resolution and successful electrical conductivity measurements in micro and nanochannels, paving the way for advanced biosensing applications.

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Innovative Top-Down Technique for Fabricating Single Nanochannels with Uniform Widths

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  1. Top-down technique ToshitakeTakahashi 03/09/2009 EE235

  2. Demonstrate a new method to fabricate single fluidic-channel of uniform channel width (11-50nm) and over 1.5cm in length • Imprint mold is created by unconventional nanofabrication (crystallographic anisotropic etching…)

  3. Overview (a) Innovative mold fabrication that creates a nanoimprint mold (b) Use of the mold to imprint the nanochannel line in a functional material layer (c) Optical RIE that transferres the imprinted patterns into a substrate

  4. Schematic of fabrication steps for making imprint mold Anisotropic wet etching with KOH Atomically smooth sidewall • Conformal deposition of SiNx • ensure uniform channel width • Channel width is defined by SiNx film thickness

  5. SEM images of each step

  6. Top-down SEM images of 17nm, 1.5cm long channel • Uniform over the entire • channel • Offer sub-10nm lithographic • resolution for patterning • sub-20nm channel line

  7. Channel continuity tests (1) Flowing colored water (2) Flowing DNA in solution DI water containing fluorescent dye (2) DNA labeled with TOTO-1 fluorescent dye

  8. Electrical conductance measurement Microchannel • With a salt solution, electrical • conductance : Gm=66.1 nS • Electrical conductivity is • σ=GmL/wd=10.2 S/m Nanochannel • Electrical conductance : Gm=0.40 pS • channel cross-section: 314 nm2 • =(17.7 nm×17.7 nm)

  9. Conclusion • Demonstrate the fabrication of a single, narrow • (as small as 11nm), long (over 1.5cm) and continuous • fluidic channel • This technique can be used for a variety of innovative • bio/chemical sensors, particullary single-stranded DNA • sequencing device

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