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one batch of the IC are from 15 IC for reason of reasonable uniform of flux

Reception test measurements. Behavior for reference IC during the one day , 16 batches. one batch of the IC are from 15 IC for reason of reasonable uniform of flux 1 central IC is as reference chamber set up HV max 1500V 50 measured points each 1 sec

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one batch of the IC are from 15 IC for reason of reasonable uniform of flux

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  1. Reception test measurements Behavior for reference IC during the one day , 16 batches • one batch of the IC are from 15 IC for reason of reasonable uniform of flux • 1 central IC is as reference chamber • set up HV max 1500V • 50 measured points each 1 sec • leakage current measurements done with picometer (noice +/-0.3 pA) • switch on rad source: Cs-137, activity 98 GBq, distance from IC-source-1.4 m, dose rate – 4.7 mSv/h • 50 measured points for rad source signal • next batch… pA N of the batch pA 1 . . 8 1.4 m . . Source N of the batch 15

  2. Leakage Current Measurements 1080 IC : Dec06,Jan07,Feb07 production March,2007, GIF The change of LC for reference IC during of the all 79 sets The same 10 IC measured twice N of the measurements 1080 IC : Dec06,Jan07,Feb07 production The 4 IC from 1080 measured at GIF has a LC problems.

  3. Leakage Current Measurementssummary 4250 IC :IHEP production pA N of the IC The IC with LC <2 pA accepted. The ~20 IC from 4250 measured at GIF has a big LC or some problems It checked in the Lab.

  4. Rad. Source Measurements pA The signal from RS for two batches pA N of the IC place in one batch N of the IC place in one batch pA The summary of signal for all batches during of the one day measurements Order N of the IC place in one batch

  5. Rad Source signal at GIF 4250 IC :IHEP production pA N of the IC The RS signal +/- 5 %. The further analysis: flux uniform, reference IC signal, all chambers will be done. 40 first measured IC at RP source facility

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