Antireflective coating - PowerPoint PPT Presentation

By: Tyler Berberich Chicago-Kent College of Law t yler.berberich@gmail.com

By: Tyler Berberich Chicago-Kent College of Law t yler.berberich@gmail.com. Nanotechnology Basics. Working at the atomic, molecular, and supramolecular levels Length scale of approximately 1-100 nm range

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Effect of Resist Thickness

Effect of Resist Thickness. Resists usually do not have uniform thickness on the wafer Edge bead: The build-up of resist along the circumference of the wafer - There are edge bead removal systems Step coverage. Centrifugal Force. Effect of Resist Thickness.

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