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Evaluating Baseline Deposition and Etch Recipes for Silicon Dioxide and Silicon Nitride using PECVD and RIE Tools

Evaluating Baseline Deposition and Etch Recipes for Silicon Dioxide and Silicon Nitride using PECVD and RIE Tools. Presented by Ayesha K. Denny NNIN RET GIFT Fellow Ga Tech MiRC Summer 2007. Research Objectives.

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Cee 100cb spinner hmds - PowerPoint PPT Presentation

Evaluating Baseline Deposition and Etch Recipes for Silicon Dioxide and Silicon Nitride using PECVD and RIE Tools