'Mask cost' diaporamas de présentation

A Cost-Driven Lithographic Correction Methodology Based on Off-the-Shelf Sizing Tools

A Cost-Driven Lithographic Correction Methodology Based on Off-the-Shelf Sizing Tools. Puneet Gupta Andrew B. Kahng Univ. of California, San Diego. Dennis Sylvester Jie Yang Univ. of Michigan, Ann Arbor. Work partially supported by MARCO GSRC and SRC. Outline . Trends in Mask Cost

483 views • 38 slides

Joining the Design and Mask Flows for Better and Cheaper Masks

Joining the Design and Mask Flows for Better and Cheaper Masks. Andrew B. Kahng (abk@cs.ucsd.edu) Puneet Gupta (puneet@ucsd.edu). Outline. Introduction Design Aware OPC Placement for Better DOF Gate Length Biasing Tying CMP and OPC Design-Based Qualification of RET.

418 views • 30 slides

Toward a Methodology for Manufacturability-Driven Design Rule Exploration

Toward a Methodology for Manufacturability-Driven Design Rule Exploration. Luigi Capodieci, Puneet Gupta, Andrew B. Kahng, Dennis Sylvester, and Jie Yang Univ. of Michigan, Ann Arbor Univ. of California, San Diego Advanced Micro Devices. Outline. Introduction

421 views • 25 slides

A Procedure and Program to Optimize Shuttle Mask Cost Advantage

A Procedure and Program to Optimize Shuttle Mask Cost Advantage. Artur Balasinski 1) , J.Cetin 1) , W.Sachs-Baker 1) A.Kahng 2) , and X.Xu 2) 1) Cypress Semiconductor 2) University of California San Diego, CA, USA. Introduction.

177 views • 17 slides

A Cost-Driven Lithographic Correction Methodology Based on Off-the-Shelf Sizing Tools

A Cost-Driven Lithographic Correction Methodology Based on Off-the-Shelf Sizing Tools. Outline. Introduction Trends in mask cost Design for value The cost of correction problem Cost of Correction Methodology Mapping the MinCorr problem to conventional performance optimization

309 views • 16 slides

Slow Wires, Hot Chips, and Leaky Transistors: New Challenges in the New Millenium

84 views • 8 slides

Focus Group 2: Spiraling mask Costs

Focus Group 2: Spiraling mask Costs. Elena Dubrova Royal Institute of Technology Are FPGAs not good enough? Hamid Savoj Magma Design Automation Wants to know everything about advanced technologies. Kemichi Kurimoto Sony Physical implementation in deep submicron Kenneth S. McElvain

175 views • 6 slides

Focus Group 2: Spiraling mask Costs

Focus Group 2: Spiraling mask Costs. Elena Dubrova Royal Institute of Technology Are FPGAs not good enough? Hamid Savoj Magma Design Automation Wants to know everything about advanced technologies. Kemichi Kurimoto Sony Physical implementation in deep submicron Kenneth S. McElvain

70 views • 6 slides