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Optical proximity correction - PowerPoint PPT Presentation


Photolithography and resolution enhancement techniques (RET)

Photolithography and resolution enhancement techniques (RET)

Photolithography and resolution enhancement techniques (RET). Photolithography and resolution limit Immersion lithography Off-axis illumination (OAI) Phase-shift mask (PSM) Optical proximity correction (OPC) Double processing.

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1.73k views • 49 slides



ME 598 – Lecture 2 - Photolithography

ME 598 – Lecture 2 - Photolithography

Thin Films. Polish. Patterned wafer. Etch. Photo. Diffusion. Test/Sort. Implant. *. ME 598 – Lecture 2 - Photolithography. Ultraviolet Light. Chrome island on glass mask. Exposed area of photoresist. Window. photoresist. Shadow on photoresist. photoresist. oxide. oxide.

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1.55k views • 24 slides


Effect of Resist Thickness

Effect of Resist Thickness

Effect of Resist Thickness. Resists usually do not have uniform thickness on the wafer Edge bead: The build-up of resist along the circumference of the wafer - There are edge bead removal systems Step coverage. Centrifugal Force. Effect of Resist Thickness.

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592 views • 13 slides


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