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Lecture 14

Lithography. Lecture 14. Taken in part from Chapters 13-15 Semiconductor Manufacturing Technology by Michael Quirk and Julian Serda. Basic concepts for photolithography, including process overview, critical dimension generations, light spectrum, resolution and process latitude.

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SU-8 Testing ( v1g)

SU-8 Testing ( v1g). Thin SU8 on glass slide Test: Soft Bake (SB) and Post Exposure Bake (PEB). “ Control ” Recipe. Spin Coating: 10 s @ 500 rpm ; 30 s @ 2000 rpm expected thickness: 600 nm Soft Bake (SB): 60 s @ 93°C Exposure: 8 s @ 275 W PEB: 60s @ 93°C

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368 views • 19 slides

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