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MEMS CLEAN ROOM

MEMS CLEAN ROOM. 1500 m 2 , class 10 150 mm (6”) Wafer line 3 shift preparation for R&D and pilot fabrication (24x5) Access to external services Technological parameter supervising system MES / PPS based planning and documentation ISO 9001 certification.

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MEMS CLEAN ROOM

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  1. MEMS CLEAN ROOM • 1500 m2, class 10 • 150 mm (6”) Wafer line • 3 shift preparation for R&D and pilot fabrication (24x5) • Access to external services • Technological parameter supervising system • MES / PPS based planning and documentation • ISO 9001 certification

  2. MEMS Clean Room LayoutAktuelle Clusterung CHARACTERIZATION & TEST BACK END WET ETCH / CLEANING INLINE METROLOGY SEM LAB CVD BACK END LOGISTICS LITHOGRAPHY DRY ETCH / PVD EXTERNAL PARTNERS HIGHTEMPERATURE GOWNING AREA CMP

  3. MEMS Clean Room: Characterization & Test

  4. MEMS Clean Room: Lithography

  5. MEMS Clean Room: Wet Etch / Cleaning

  6. MEMS Clean Room: Wet Etch / Cleaning

  7. MEMS Clean Room: Dry Etch / Strip Resist

  8. MEMS Clean Room: Backend (Bonding, Dispense)

  9. MEMS Clean Room: Inline Metrology

  10. MEMS Clean Room: Inline Metrology

  11. MEMS Clean Room: SEM

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