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Characterization of Double Wedge Samples: E-Beam Exposure and Annealing Analysis

This report details the measurement and analysis of double wedge samples processed on February 28, 2011. It includes a comprehensive overview of annealing directions and conditions used during experiments. Only chips labeled "Yes" were subjected to the e-beam tool, while unshaded chips are expected to be open devices with nearly infinite resistance. Data on the thermal and electrical properties of these samples is provided, paving the way for enhanced understanding of their behavior under specific processing conditions.

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Characterization of Double Wedge Samples: E-Beam Exposure and Annealing Analysis

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  1. SWS2171 Double wedge 2011-02-28

  2. Measured samples a3 Yes yes Yes b3 c3 Annealing Direction d1 d2 d4 d3 e3 f3 Yes Yes Yes g3 h3 Only chips labeled “Yes” were exposed in the e-beam tool. Unshaded chips should all be open devices, i.e. nearly infinite resistance.

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