'65 nm' diaporamas de présentation

CS 258 Parallel Computer Architecture Lecture 1 Introduction to Parallel Architecture

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Noise measurements on 65 nm CMOS transistors at very high total ionizing dose

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Metrology Roadmap 2002 Update

Metrology Roadmap 2002 Update. Europe Uli Mantz (Infineon) Alec Reader (Philips Analytical) Mauro Vascone (ST) Japan Mashino Ikeno (Mitsubishi) Toshihiko Osada (Fugijitsu) Korea DH Cho (Samsung) Taiwan Henry Ma (EPISIL) US Steve Knight (NIST)

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CPPM ATLAS Pixel upgrade pour HL LHC LPNHE, Paris 10 octobre 2012 A.Rozanov

CPPM ATLAS Pixel upgrade pour HL LHC LPNHE, Paris 10 octobre 2012 A.Rozanov . IBL construction and installation 2013-2014. IBL Stave-0 final qualification. Stave=0 have been thermally qualified and is under Thermal and pressure cycles

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Pixel front-end development

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Statistical Timing in a Practical 65 nm Robust Design Flow

Statistical Timing in a Practical 65 nm Robust Design Flow. Chandu Visweswariah. The power of statistical formulas. Acknowledgements.

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WP1 - Common Microelectronic Technologies for HEP

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Status of CMOS 65nm technology access, distribution and IP blocks development

Status of CMOS 65nm technology access, distribution and IP blocks development. Microelectronics User Group TWEPP 2013. Sandro Bonacini CERN, PH-ESE dept. CH1211, Geneve 23 Switzerland. O utline. Motivation for use of 65 nm CMOS technology Radiation performance

535 views • 21 slides

Status of CMOS 65nm technology access, distribution and IP blocks development

Status of CMOS 65nm technology access, distribution and IP blocks development. Microelectronics User Group TWEPP 2013. Sandro Bonacini CERN, PH-ESE dept. CH1211, Geneve 23 Switzerland. O utline. Motivation for use of 65 nm CMOS technology Radiation performance

414 views • 21 slides

Design tools and foundry access service plans for 65 nm technologies

Design tools and foundry access service plans for 65 nm technologies. Microelectronics User Group TWEPP 2012. Sandro Bonacini CERN, PH-ESE dept. CH1211, Geneve 23 Switzerland. O utline. Motivation for use of 65 nm CMOS technologies Technology options for 65 nm Devices Metal stack

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OMEGAPIX2 and 65 nm @ LAL

OMEGAPIX2 and 65 nm @ LAL. D. Thienpont, J. Tongbong. OMEGAPIX2 submission. Circuit has been submitted in October 10th via CMP 96 x 24 pixels, 35x200 ? m 2 tiers Analog tier: analog front-end, DACs, BIAS, rad-hard digital cells (Triple Voting)

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SCENARIO CONCEPT

SCENARIO CONCEPT. MPC Conference, Juneau, AK 17-19 Jan 2011. Cecil McNutt D17 (dxc). Why a fact based Scenario?. Increase Awareness. Focused Discussion. Scenario not a Secret. $$$ tied to Scenario. What the Scenario covers. The Emergency Phase. Command Post s Still In Formation.

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Elmore Routing Tree (ERT) Algorithm

Elmore Routing Tree (ERT) Algorithm. Perform ERT algorithm under 65 nm technology Unit-length resistance r = 0.4 ? / ? m Unit-length capacitance c = 0.2 f F / ? m Driver output resistance r d = 250 ? Sink input capacitance r = 50 f F. Adding First Edge.

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Design of Next-Generation FPGA w ith Hierarchical Interconnect Architecture

Design of Next-Generation FPGA w ith Hierarchical Interconnect Architecture. Cheng C. Wang, Fang-Li Yuan, Henry Chen, Rashmi Nanda, and Chia-Hsiang Yang Advisor: Prof. Dejan Markovic. ?. Introductions. Xilinx Virtex, Altera Stratix, etc. 2-D mesh network: O(N 2 )

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Microelectronics User Group Meeting Wrap-up

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Microelectronics User Group Meeting Wrap-up

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WP microelectronics and interconnections

WP microelectronics and interconnections. Goal : provide chips and interconnections to the other WPs Task 1 : 65 nm chips for trackers ( CERN?) Fine pitch, low power, advanced digital processing Taks 2 : SiGe 180nm for calorimeters / gaseous (IN2p3)

187 views • 6 slides