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This lecture covers the estimation of power activity factors in digital circuits, focusing on the probability of node state transitions and the implications for power consumption. Key concepts include defining the activity factor, analyzing logic gate behaviors with AND and OR configurations, and exploring nonideal transistor behaviors such as leakage currents and threshold voltage effects. The lecture also addresses dynamic logic circuit families and their operational principles, highlighting key factors affecting transistor performance in modern integrated circuits.
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Activity Factor Estimation • Activity factor: probability athat a node switches 0→1 • Define probability Pi that a node is “1” • Probability that a node is “0” is then Pi = 1-Pi • ai = Pi * Pi • Completely random data has P = 0.5 and a = 0.25 • Data is often not completely random • Data propagating through ANDs and ORs has lower activity factor • Depends on design, but typically a≈ 0.1 7: Power
Switching Probability 7: Power
Example • A 4-input AND is built out of two levels of gates • Estimate the activity factor at each node if the inputs have P = 0.5 NAND: If A and B are ”ones” there will be a ”0” output: PNAND=1-PAPB NOR: If n1 and n2 are ”zeroes” there will be a ”1” output: PNOR=P1P2 NAND NOR NAND 7: Power
ON and OFF Current • Ion = Ids @ Vgs = Vds = VDD • Saturation • Ioff = Ids @ Vgs = 0, Vds = VDD • Cutoff 4: Nonideal Transistor Theory
Leakage Sources • Subthreshold conduction • Transistors can’t abruptly turn ON or OFF • Dominant source in contemporary transistors • Gate leakage • Tunneling through ultrathin gate dielectric • Junction leakage • Reverse-biased PN junction diode current 4: Nonideal Transistor Theory
Leakage • What about current in cutoff? • Simulated results • What differs? • Current doesn’t go to 0 in cutoff 4: Nonideal Transistor Theory
DIBL • Electric field from drain affects channel • More pronounced in small transistors where the drain is closer to the channel • Drain-Induced Barrier Lowering • Drain voltage also affect Vt • High drain voltage causes current to increase. 4: Nonideal Transistor Theory
Threshold Voltage Effects • Vt is Vgs for which the channel starts to invert • Ideal models assumed Vt is constant • Really depends (weakly) on almost everything else: • Body voltage: Body Effect • Drain voltage: Drain-Induced Barrier Lowering • Channel length: Short Channel Effect 4: Nonideal Transistor Theory
Body Effect • Body is a fourth transistor terminal • Vsb affects the charge required to invert the channel • Increasing Vs or decreasing Vb increases Vt • fs = surface potential at threshold • Depends on doping level NA • And intrinsic carrier concentration ni • g = body effect coefficient 4: Nonideal Transistor Theory
Body Effect • Body is a fourth transistor terminal • Vsb affects the charge required to invert the channel • Increasing Vs or decreasing Vb increases Vt • fs = surface potential at threshold • Depends on doping level NA • And intrinsic carrier concentration ni • g = body effect coefficient 4: Nonideal Transistor Theory
Body Effect Cont. • For small source-to-body voltage, treat as linear 4: Nonideal Transistor Theory
Gate Leakage • Carriers tunnel thorough very thin gate oxides • Exponentially sensitive to tox and VDD • A and B are tech constants • Greater for electrons • So nMOS gates leak more • Negligible for older processes (tox > 20 Å) • Critically important at 65 nm and below (tox≈ 10.5 Å) From [Song01] 4: Nonideal Transistor Theory
Subthreshold Leakage • Subthreshold leakage exponential with Vgs • n is process dependent • typically 1.3-1.7 • Rewrite relative to Ioff on log scale • S ≈ 100 mV/decade @ room temperature 4: Nonideal Transistor Theory
Subthreshold Leakage • For Vds > 50 mV • Ioff = leakage at Vgs = 0, Vds = VDD Typical values in 65 nm Ioff = 100 nA/mm @ Vt = 0.3 V Ioff = 10 nA/mm @ Vt = 0.4 V Ioff = 1 nA/mm @ Vt = 0.5 V h = 0.1 kg= 0.1 S = 100 mV/decade 7: Power
Stack Effect • Series OFF transistors have less leakage • Vx > 0, so N2 has negative Vgs • Leakage through 2-stack reduces ~10x • Leakage through 3-stack reduces further 7: Power
NAND3 Leakage Example • 100 nm process Ign = 6.3 nA Igp = 0 Ioffn = 5.63 nA Ioffp = 9.3 nA Data from [Lee03] 7: Power
Outline • Pseudo-nMOS Logic • Dynamic Logic • Pass Transistor Logic 10: Circuit Families
Introduction • What makes a circuit fast? • I = C dV/dt -> tpd (C/I) DV • low capacitance • high current • small swing • Logical effort is proportional to C/I • pMOS are the enemy! • High capacitance for a given current • Can we take the pMOS capacitance off the input? • Various circuit families try to do this… 10: Circuit Families
Pseudo-nMOS • In the old days, nMOS processes had no pMOS • Instead, use pull-up transistor that is always ON • In CMOS, use a pMOS that is always ON • Ratio issue • Make pMOS about ¼ effective strength of pulldown network 10: Circuit Families
Dynamic Logic • Dynamic gates uses a clocked pMOS pullup • Two modes: precharge and evaluate 10: Circuit Families
The Foot • What if pulldown network is ON during precharge? • Use series evaluation transistor to prevent fight. 10: Circuit Families
Monotonicity • Dynamic gates require monotonically rising inputs during evaluation • 0 -> 0 • 0 -> 1 • 1 -> 1 • But not 1 -> 0 10: Circuit Families
Monotonicity Woes • But dynamic gates produce monotonically falling outputs during evaluation • Illegal for one dynamic gate to drive another! 10: Circuit Families
Domino Gates • Follow dynamic stage with inverting static gate • Dynamic / static pair is called domino gate • Produces monotonic outputs 10: Circuit Families
Charge Sharing • Dynamic gates suffer from charge sharing 10: Circuit Families