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Making Uniform Thin Films

Making Uniform Thin Films. Brett Bostrom , Dr . R. Steven Turley, Dr. David Allred Brigham Young University. “The Skinny”. No one universal reflector for XUV Changing thickness changes behavior ( Γ = 2n d cos β ) Uniformity is crucial!. 1 – 100 nm. Thin Film.

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Making Uniform Thin Films

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  1. Making Uniform Thin Films Brett Bostrom, Dr. R. Steven Turley, Dr. David Allred Brigham Young University

  2. “The Skinny” • No one universal reflector for XUV • Changing thickness changes behavior (Γ = 2ndcosβ) • Uniformity is crucial!

  3. 1 – 100 nm Thin Film Substrate (Silicon Wafer, Glass, etc.)

  4. The Process of Deposition • Different methods for deposition • Thermal Evaporation • Magnetron Sputtering

  5. Stage Substrate Metal Atoms + Ar ions + Ar ions _ Target Magnet High-Voltage Power Supply

  6. Complications • High Vacuum • Oxidation • Uniformity

  7. Magnetic field

  8. Reducing Thickness Variance • Stepper Motor • Planetary Gears • Multiple revolutions

  9. Steps to degrees • Revolutions • Initial/Final positions

  10. Target Stage

  11. Expected Results • Automated system • More Consistent results • More Uniform films

  12. Comparison Stationary Revolution only

  13. Planetary motion

  14. Acknowledgments • Dr. Turley • Dr. Allred • John Ellsworth • Chris Cosio • James Vaterlaus

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