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French IRFU Collisioner Days . CEA Saclay, November 27-29th 2013 PowerPoint Presentation
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French IRFU Collisioner Days . CEA Saclay, November 27-29th 2013

French IRFU Collisioner Days . CEA Saclay, November 27-29th 2013

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French IRFU Collisioner Days . CEA Saclay, November 27-29th 2013

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  1. R&D High Gradient Cavities F. Eozenou French IRFU CollisionerDays. CEA Saclay,November 27-29th 2013 High Gradient Cavities, November 28th 2013

  2. OUTLINE • Context • ILC/S0 achievements • Worldwide R&D activities • High gradient R&D activitiesat CEA/IRFU

  3. CONTEXT • ILC: ~16000Superconductive Niobium cavities > 31.5 MV/m = cost driver • Challenging performance • Requires a worldwide effort Horizontal EP set-upat KEK CleanroomAssemblyat CEA/IRFU Requiresperfectknowledge of SRF technologyfromcavity fabrication to cleanroomassembly

  4. BULK Niobium close to itsultimate performances Eacc (MV/m) • Main breakthroughsin the 90’s for performance improvement: • Hydride cure (800°C heating) • Cleaning (High Pressure Rinsing) • Baking (120°C) • Electropolishing

  5. ILC Standard RECIPE EP and Bakingset-up @ KEK • Light chemical etching (10µm) • Heavy electropolishing (EP) (100-120µm) ~ 7h • Cleaning • 800°C x 2h degassing • Tuning • Light EP (25µm) ~ 1h30 • Cleaning • High Pressure Rinsing (HPR) (2x6h) • Cleanroom assembly • HV Baking 120°Cx48h • = Time Consuming HPR= UP water sprayedat100 bars for cleaning Nb Polishing: Removing of the damaged layer/surface smoothening Cleaning: Removing of chemicalresiduals Baking: Degassing of niobium, Q0 cure, higher gradients

  6. FOCUS ON ELECTROPOLISHING PROCESS Process • Nb polishedinternallywith an electrolyte • (concentrated H2SO4 - HF mixture) under constant voltage • Cavity = Anode & Cathode is an Al pipe inside the cavity Chemicalreactions • - Anode: Niobium oxidation • 2 Nb + 5 H2O  Nb2O5 + 10 H+ + 10 e- • - Cathode: H2generation • 2 H+ + 2 e- H2 (Teflon net to prevent H contamination) • - HF: dissolution of oxide Nb2O5 layer • - H2SO4: forming of a viscous layer Rawmaterial EP’ed 100 µm Obtention of lawroughness 0.1µm

  7. Details OF NB ELECTROPOLISHING Acid mixture Aluminum Cathode H2 Rotatingcavity = Anode - SO42- S Al 3+ H+ Nb5+ + Titre | Date

  8. OBJECTIVE OF THE R&D (I) • Improve the yield of the cavity gradient: Goal of S0 program: reaching 90% yieldabove 35MV/m a) After 1stpass b) After 2d pass* *2d pass = Re-EP or Re-HPR From ILC TDR report • 75% (±11%) above 35MV/m and 94% (±6%) above 28MV/m in 2010-2012. • developmentof repairing techniques, inspection of cavities, etc.

  9. TECHNICAL DeVELOPMENTS DURING S0 program Scratches on iris After grinding Repairing technique: Local grinding by KEK Improved inspection techniques: OBACHT (Desy) and Kyoto Camera (Kyoto U./KEK) Temperaturemappingsystems, measurements by 2dsound, etc.

  10. OBJECTIVE OF THE R&D (II) • Transfer of the technology to industry for large scale production. • Paramount importance of the cavity production for the XFEL linac: • Similarcavity vs. ILC • Similartreatmentrecipe • Large scale production (800 cavities, ILC/20) ChemicaltreatmentatZanon D. Reschke, THIA01, SRF 2013 79 cavitiesreceivedfrom 2 vendors (RI, Zanon) Average maximum gradient: (30.9 ± 4.9) MV/m after 2d pass.

  11. OBJECTIVE OF THE R&D (III) • Developsimplerprocess • Developsaferprocess (HF-free recipe) • Improve Q0

  12. R&D for SaferProcesses

  13. CAVITY Tumbling (I)aka ‘CentrIfugal Barrel POLISHING’ CBP A.D. Palczewski, TUIOB01,SRF 2013 1-cell CBP at RRCAT 9 mm stone Decreasing abrasive size • The cavityismechanicallypolished • It isfilledwith abrasive components and rotated • Differentsteps are necessarywithdecrease in abrasive size • Mirror-like final surface finishing • Developpedat FNAL, JLAB, KEK, RRCAT, DESY, INFN

  14. CAVITY TUMBLING (II) • Promisingresults on cavity • Smooth surface • Repairing technique • Lowremoval rate • Multi-stepprocess A.D. Palczewski et al., IPAC2012,WEPPC094

  15. HF-Free RECIPE:Bi-POLAR ELECTROPOLISHING A. Rowe, SRF 2013, TUIOC02 • EP in diluted H2SO4electrolyte • Non-constant voltage: reverse pulse for de-passivation • Collaboration FERMILAB-Faraday Technology INC. • Promisingresults on cavities but lowremoval rate: 1.5µm/hr

  16. HF-free RECIPE: EP WITH IONIC LIQUID @ INFN V.B. Pastushenko, SRF 2013, TUIOC03 • The recipe has been optimized for samples • Improvements for cavitytreatment • High temperaturetreatment 6GHz cavityaftertreatment in vertical position 6GHz half-cavityaftertreatment in horizontal position

  17. DecreasingProcessing Time

  18. REDUCTION OF BAKING TIME FastBaking technique developpedat CEA Saclay: Bakingunder Argon athigher T: 3h baking. B. Visentin, SRF 2007, TUP69, pp. 304-307

  19. ALTERNATIVE ELECTROLYTE • Buffered EP developpedat J-Lab and PKU: • Mixture of Lactic-HF-Sulfuricacids • Verylowroughnessachieved • Very high removal rate: up to 10 µm/min Cathodes testedat J-Labduring BEP studies EP BEP

  20. High Q0Research

  21. SEEK FOR HIGHER Q0 (See SRF 2013) • Doping withimpurities as N • A. Grasselino, TUIOA03 • Treatment of external surface of the cavity • V. Palmieri, MOIOCO1 • Optimization of cooling • J.M. Vogt, TUIOA02 • Deposition techniques: Nb3Sn • M. Lieppe, S. Posen, WEIOA04

  22. Vertical Electropolishing (VEP)

  23. MAIN VEP faciLITIES IN THE WORLD CERN CEA/IRFU Cornell F. Furuta, IPAC 2012, TUPPR045 & SRF 2013, TUIOC01 F. Eozenou et al. PRST-AB, 15, 083501 (2012) & SRF 2013, TUP046 S. Calatroni et al. LINAC 2010, THP032, pp 824-826 & SRF 2013, TUP047

  24. VERTICAL ELECTROPOLISHING F. Furuta, IPAC 2012, TUPPR045 • High gradient demonstratedatCornell but: • Final VEP removalshouldbethin to avoiddecrease in Eacc • → Proposalat CEA Saclay IRFU for a set-upwithcirculatingacid

  25. Horizontal vs Vertical • Pros: • Good evacuation of gases (cavityhalffilled) • Demonstratedefficiency • Large range of parameters • Pros: • Simple process • Lowfloor surface • Improvedsafety • Higherremoval rate • Cons: • Complicatedprocess • Rotary seals • Switching of the cavity • Lowremoval rate • Cons: • Sensitive to fluiddynamics • Properparameters to bedetermined… …Voltage and fluidvelocity

  26. HIGH GRADIENT ACTIVITIES IN FRANCE

  27. JAPAN-France TYL COLLABORATION (previously LIA) 2007-… • Previous collaboration within A_RD_5 program: Surface treatment • New equipmentsat KEK & Irfu • Extension of our expertise fromcavity fabrication to Vertical Test • Involvement of industrialpartners • → A_RD_9: Effort towards improving large scale production of SC cavities • Collaboration KEK – CEA and industrial partner: Marui Galvanizing Co. Ltd. Since 2012, additionnal collaboration KEK-IRFU: A_RD_7: Study on the magneticsghielding for SC cavities(M. Mazusawa, J. Plouin)

  28. Fluid velocity [HF] at 4 000 s [HF] at 20 000 s ACHIEVEMENTS WITHIN A_RD_5 (I) • Improvement of cleaningrecipes, ie: • Spongecleaning technique • Improvement of rinsingafterEP • Modelling of EP, understanding of fieldflatnessdeteriorationafter EP • Modellingwith COMSOL: • Fluiddynamic • Acid concentration EP shouldbeconsidered as an asymetricprocess

  29. ACHIEVEMENTS WITHIN A_RD_5 (II) • Study of contamination related to chemicaltreatments: high voltage and high current EP are likely to generatesulfur compounds • Succesfulevaluation of repairing technique such as grinding Sample A, 20 Volts: 9.18g removed 51 hours EP Sample B, 5 Volts: 9.11g removed 115 hours EP Example of XPS Analysisat KEK

  30. ELECTROPOLISHING AT IRFU: 2004-2013 • EP on samples (CARE program): 2004-… • Parametersoptimization • Understanding of the process (F- diffusion) • Study of the aging of electrolytes • Sulfur contamination • 1-Cell Horizontal EP: 2006-2009 • Achievement of high gradients • Alternative recipetested • Achievement of high Q0 • Low voltage EP • Design of a new VEP system: 2009-… • Operating since 2011 • Optimization on 1-Cell cavities • Operationwith ILC and SPL cavities

  31. VEP AT CEA SACLAY TB9RI025 cavity Prior to VEP • Circulatingacid • Constant voltage • Nitrogenblowing • VEP of 1-Cell and 9-Cell cavities • Focus on parameters: low voltage (~ 6V) – high acid flow (25L/min) • Improveddegassing (H2 , O2) • Lowerheating • Four 1-Cell cavities and one 9-cell cavityprepared by VEP

  32. Low Voltage VEP: 1st Result VEP of cavitywithlow surface quality (pits) • Better surface achieved • Pitspartiallyremoved • In spite of pits, the cavityistested → Quenchat 34MV/m at the pit area (Standard Q-Slopebeforebaking)

  33. VEP ExPERIMENTS COMBINED WITHRESEARCH OF QUENCH BY 2d sound Monocellcavity 1,3 GHz 4 OSTs are placedaround the cavity, in the equator plane Presented by J. Plouin at TTC 2012, JLab. OSTs → Study of the quenchmorphology by replica technique. S. Berry et al. SRF 2003, THP04, 591-595 Temperaturemapping → Quenchlocated at the pit area

  34. Eacc > 41 MV/m on 1Cell Cavity with Parameters: Low Voltage – High Acid Flow • 1DE1: Horizontal EP + 70 µm VEP • Parameters: 6V & >24L/min • Bright and smooth surface • Performance before/afterbakingsimilar to HEP • High gradient maintainedafter VEP 1DE1 after HEP + 70 µm VEP • Aspects to improve: • Lowremoval rate at 19°C: 0.2µm/min • asymmetry: removal rate higher in the upper part of the cell (x 3) higher local removal Acid flow

  35. TECHNICAL PROPOSAL BY MARUI Co Ltd Use of a cathode with a specificshape: i-Ninja® cathode SRF 2013, TUP052 • Rotating Cathode withretractablewings • Uniform anode-cathode distance • Betterhydrogenremoval • 1-Cell cavity exchange programmwithin TYL. Improvedfluid distribution withunfolded cathode.

  36. RESULTS ON 9-CELL ILC CAVITY At IRFU RF results for ILC TB9R1025 cavity at 1.6 - 1.9K after HEP + 50µm VEP at 6V. • Resultslimited by fieldemission • New cleanroom in construction willmake possible a betterassembly of the cavity

  37. OUTLOOK • Recentresult: Q0 2E11 after VEP on 1-Cell cavity (withoutbaking) • → Experiments on 1-Cell cavities to becontinued • Full treatment of 9-Cell cavitiesfrom

  38. CONCLUSION • Technicalmaturity: Results close to ultimate performance • Improvement of the yieldduring ILC TDP phase • Technologysuccesfullyapplied in XFEL project • R&D isgoing on • Simplerprocess • Costreduction • Saferprocess • Higher Q0 • Vertical ElectropolishingdevelopedatCEA/IRFU

  39. THANK YOU FOR YOUR ATTENTION