Introduction to CMOS VLSI Design CMOS Transistor Theory

1. Introduction toCMOS VLSIDesignCMOS Transistor Theory

2. Outline • Introduction • MOS Capacitor • nMOS I-V Characteristics • pMOS I-V Characteristics • Gate and Diffusion Capacitance • Pass Transistors • RC Delay Models MOS devices

3. Introduction • So far, we have treated transistors as ideal switches • An ON transistor passes a finite amount of current • Depends on terminal voltages • Derive current-voltage (I-V) relationships • Transistor gate, source, drain all have capacitance • I = C (DV/Dt) -> Dt = (C/I) DV • Capacitance and current determine speed • Also explore what a “degraded level” really means MOS devices

4. MOS Capacitor • Gate and body form MOS capacitor • Operating modes • Accumulation • Depletion • Inversion MOS devices

5. Terminal Voltages • Mode of operation depends on Vg, Vd, Vs • Vgs = Vg – Vs • Vgd = Vg – Vd • Vds = Vd – Vs = Vgs - Vgd • Source and drain are symmetric diffusion terminals • By convention, source is terminal at lower voltage • Hence Vds 0 • nMOS body is grounded. First assume source is 0 too. • Three regions of operation • Cutoff • Linear • Saturation MOS devices

6. nMOS Cutoff • No channel • Ids = 0 MOS devices

7. nMOS Linear • Channel forms • Current flows from d to s • e- from s to d • Ids increases with Vds • Similar to linear resistor MOS devices

8. nMOS Saturation • Channel pinches off • Ids independent of Vds • We say current saturates • Similar to current source MOS devices

9. I-V Characteristics • In Linear region, Ids depends on • How much charge is in the channel? • How fast is the charge moving? MOS devices

10. Channel Charge • MOS structure looks like parallel plate capacitor while operating in inversion • Gate – oxide – channel • Qchannel = MOS devices

11. Channel Charge • MOS structure looks like parallel plate capacitor while operating in inversion • Gate – oxide – channel • Qchannel = CV • C = MOS devices

12. Channel Charge • MOS structure looks like parallel plate capacitor while operating in inversion • Gate – oxide – channel • Qchannel = CV • C = Cg = eoxWL/tox = CoxWL • V = Cox = eox / tox MOS devices

13. Channel Charge • MOS structure looks like parallel plate capacitor while operating in inversion • Gate – oxide – channel • Qchannel = CV • C = Cg = eoxWL/tox = CoxWL • V = Vgc – Vt = (Vgs – Vds/2) – Vt Cox = eox / tox MOS devices

14. Carrier velocity • Charge is carried by e- • Carrier velocity v proportional to lateral E-field between source and drain • v = MOS devices

15. Carrier velocity • Charge is carried by e- • Carrier velocity v proportional to lateral E-field between source and drain • v = mE m called mobility • E = MOS devices

16. Carrier velocity • Charge is carried by e- • Carrier velocity v proportional to lateral E-field between source and drain • v = mE m called mobility • E = Vds/L • Time for carrier to cross channel: • t = MOS devices

17. Carrier velocity • Charge is carried by e- • Carrier velocity v proportional to lateral E-field between source and drain • v = mE m called mobility • E = Vds/L • Time for carrier to cross channel: • t = L / v MOS devices

18. nMOS Linear I-V • Now we know • How much charge Qchannel is in the channel • How much time t each carrier takes to cross MOS devices

19. nMOS Linear I-V • Now we know • How much charge Qchannel is in the channel • How much time t each carrier takes to cross MOS devices

20. nMOS Linear I-V • Now we know • How much charge Qchannel is in the channel • How much time t each carrier takes to cross MOS devices

21. nMOS Saturation I-V • If Vgd < Vt, channel pinches off near drain • When Vds > Vdsat = Vgs – Vt • Now drain voltage no longer increases current MOS devices

22. nMOS Saturation I-V • If Vgd < Vt, channel pinches off near drain • When Vds > Vdsat = Vgs – Vt • Now drain voltage no longer increases current MOS devices

23. nMOS Saturation I-V • If Vgd < Vt, channel pinches off near drain • When Vds > Vdsat = Vgs – Vt • Now drain voltage no longer increases current MOS devices

24. nMOS I-V Summary • Shockley 1st order transistor models MOS devices

25. Example • Example: a 0.6 mm process from AMI semiconductor • tox = 100 Å • m = 350 cm2/V*s • Vt = 0.7 V • Plot Ids vs. Vds • Vgs = 0, 1, 2, 3, 4, 5 • Use W/L = 4/2 l MOS devices

26. pMOS I-V • All dopings and voltages are inverted for pMOS • Mobility mp is determined by holes • Typically 2-3x lower than that of electrons mn • 120 cm2/V*s in AMI 0.6 mm process • Thus pMOS must be wider to provide same current • In this class, assume mn / mp = 2 MOS devices

27. Capacitance • Any two conductors separated by an insulator have capacitance • Gate to channel capacitor is very important • Creates channel charge necessary for operation • Source and drain have capacitance to body • Across reverse-biased diodes • Called diffusion capacitance because it is associated with source/drain diffusion MOS devices

28. Gate Capacitance • Approximate channel as connected to source • Cgs = eoxWL/tox = CoxWL = CpermicronW • Cpermicron is typically about 2 fF/mm MOS devices

29. Diffusion Capacitance • Csb, Cdb • Undesirable, called parasitic capacitance • Capacitance depends on area and perimeter • Use small diffusion nodes • Comparable to Cg for contacted diff • ½ Cg for uncontacted • Varies with process MOS devices

30. Pass Transistors • We have assumed source is grounded • What if source > 0? • e.g. pass transistor passing VDD MOS devices

31. Pass Transistors • We have assumed source is grounded • What if source > 0? • e.g. pass transistor passing VDD • Vg = VDD • If Vs > VDD-Vt, Vgs < Vt • Hence transistor would turn itself off • nMOS pass transistors pull no higher than VDD-Vtn • Called a degraded “1” • Approach degraded value slowly (low Ids) • pMOS pass transistors pull no lower than Vtp MOS devices

32. Pass Transistor Ckts MOS devices

33. Pass Transistor Ckts MOS devices

34. Effective Resistance • Shockley models have limited value • Not accurate enough for modern transistors • Too complicated for much hand analysis • Simplification: treat transistor as resistor • Replace Ids(Vds, Vgs) with effective resistance R • Ids = Vds/R • R averaged across switching of digital gate • Too inaccurate to predict current at any given time • But good enough to predict RC delay MOS devices

35. RC Delay Model • Use equivalent circuits for MOS transistors • Ideal switch + capacitance and ON resistance • Unit nMOS has resistance R, capacitance C • Unit pMOS has resistance 2R, capacitance C • Capacitance proportional to width • Resistance inversely proportional to width MOS devices

36. RC Values • Capacitance • C = Cg = Cs = Cd = 2 fF/mm of gate width • Values similar across many processes • Resistance • R  6 KW*mm in 0.6um process • Improves with shorter channel lengths • Unit transistors • May refer to minimum contacted device (4/2 l) • Or maybe 1 mm wide device • Doesn’t matter as long as you are consistent MOS devices

37. Inverter Delay Estimate • Estimate the delay of a fanout-of-1 inverter MOS devices

38. Inverter Delay Estimate • Estimate the delay of a fanout-of-1 inverter MOS devices

39. Inverter Delay Estimate • Estimate the delay of a fanout-of-1 inverter MOS devices

40. Inverter Delay Estimate • Estimate the delay of a fanout-of-1 inverter d = 6RC MOS devices