Electrical and Computer Engineering and Network for Computational Nanotechnology
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IEEE Central NC EDS/MTT/SSC Society Friday, Nov. 5th, 2010 The Nanoscale MOSFET: Physics and Limits Mark Lundstrom. Electrical and Computer Engineering and Network for Computational Nanotechnology Birck Nanotechnology Center Purdue University, West Lafayette, Indiana USA.
Electrical and Computer Engineering and Network for Computational Nanotechnology
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IEEE Central NC EDS/MTT/SSC Society Friday, Nov. 5th, 2010The Nanoscale MOSFET:Physics and LimitsMark Lundstrom Electrical and Computer Engineering and Network for Computational Nanotechnology Birck Nanotechnology Center Purdue University, West Lafayette, Indiana USA
21st Century: microelectronics nanoelectronics transistors per cpu chip Lundstrom
nanoscale MOSFETs 2010 gate electrode channel ~ 32 nm gate oxide EOT~ 1.1 nm S G D source drain SiO2 silicon
gate-voltage controlled current source gate-voltage controlled resistor MOSFET IV characteristic circuit symbol D G S (Courtesy, Shuji Ikeda, ATDF, Dec. 2007)
gate-voltage controlled resistor MOSFET IV: low VDS VG>VT 0 VD
gate-voltage controlled current source 2 MOSFET IV: high VDS 0 VG VD
velocity saturation 107 velocity cm/s ---> 105 104 electric field V/cm --->
(Courtesy, Shuji Ikeda, ATDF, Dec. 2007) MOSFET IV: velocity saturation 0 VG VD
carrier transport nanoscale MOSFETs Velocity (cm/s) D. Frank, S. Laux, and M. Fischetti, Int. Electron Dev. Mtg., Dec., 1992. Lundstrom
~1995 - 2000 Moore’s Law? Molecular electronics http://www.eng.yale.edu/reedlab/ Lundstrom
objectives Present a simple, physical picture of the nanoscale MOSFET (to complement, not supplement simulations). Discuss ballistic limits, velocity saturation, and quantum limits in nanotransistors. Compare to experimental results for Si and III-V FETs Discuss scattering in nano-MOSFETs Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
how transistors work 2007 N-MOSFET electron energy vs. position electron energy vs. position (Courtesy, Shuji Ikeda, ATDF, Dec. 2007) E.O. Johnson, “The IGFET: A Bipolar Transistor in Disguise,” RCA Review, 1973
MOSFETs are barrier controlled devices 2) region under strong\ control of gate 1) “Well-tempered MOSFET” 3) Additional increases in VDS drop near the drain and have a small effect on ID M. Lundstrom, IEEEEDL, 18, 361, 1997. A. Khakifirooz, O. M. Nayfeh, D. A. Antoniadis, IEEE TED, 56, pp. 1674-1680, 2009.
current flows when the Fermi-levels are different gate Lundstrom
LDOS “device” contact 1 contact 2 “top of the barrier model” energy position Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
ballistic MOSFET: linear region near-equilibrium Lundstrom
linear region with MB statistics Boltzmann statistics: (MOS electrostatics) ✔ Lundstrom
ballistic MOSFET: linear region near-equilibrium Lundstrom
relation to conventional expression ballistic MOSFET conventional MOSFET Lundstrom
ballistic MOSFET: on-current Lundstrom
saturated region with MB statistics Boltzmann statistics: ✔ Lundstrom
under low VDS Lundstrom
under high VDS Lundstrom
velocity vs. VDS Lundstrom
velocity vs. VDS Velocity saturates in a ballistic MOSFET but at the top of the barrier, where E-field = 0. Lundstrom
2007 N-MOSFET (Courtesy, Shuji Ikeda, ATDF, Dec. 2007) velocity saturation in a ballistic MOSFET velocity saturation Lundstrom
aside: relation to conventional expression ballistic MOSFET conventional MOSFET Lundstrom
the ballistic IV (Boltzmann statistics) ballistic on-current ballistic channel resistance K. Natori, JAP, 76, 4879, 1994. Lundstrom
comparison with experiment: Silicon • Si MOSFETs deliver > one-half of the ballistic on-current. (Similar for the past 15 years.) • MOSFETs operate closer to the ballistic limit under high VDS. A. Majumdar, Z. B. Ren, S. J. Koester, and W. Haensch, "Undoped-Body Extremely Thin SOI MOSFETs With Back Gates," IEEE Transactions on Electron Devices, 56, pp. 2270-2276, 2009. Device characterization and simulation: Himadri Pal and Yang Liu, Purdue, 2010.
comparison with experiment: InGaAs HEMTs Jesus del Alamo group (MIT) Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
X X X transmission and carrier scattering λ0 is the mean-free-path for backscattering Lundstrom
the quasi-ballistic MOSFET Lundstrom
on current and transmission Lundstrom
the quasi-ballistic MOSFET Lundstrom
scattering under high VDS Lundstrom
connection to traditional model (high VDS) how do we interpret this result? Lundstrom
the MOSFET as a BJT “base” ‘bottleneck’ “collector” Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
3) The on-current is controlled by the ballistic injection velocity - not the high-field, bulk saturation velocity. 2) The channel resistance has a lower limit - no matter how high the mobility is. physics of nanoscale MOSFETs 4) Channel velocity saturates near the source, not at the drain end. 1) Transistor-like I-V characteristics are a result of electrostatics. Lundstrom
limits to barrier control: quantum tunneling 4) 3) 1) 2) from M. Luisier, ETH Zurich / Purdue
21st Century electronics? Moore’s Law? Lundstrom
21st Century electronics 1) Information processing dominated by “Si CMOS” 2) SOC’s complemented by “CMOS+” technologies 3) and….. macroelectronics, power electronics, PV, solid-state lighting, thermoelectrics, … Lundstrom
for more information 1) “Physics of Nanoscale MOSFETs,” a series of eight lectures on the subject presented at the 2008 NCN@Purdue Summer School by Mark Lundstrom, 2008. http://nanohub.org/resources/5306 2) “Electronic Transport in Semiconductors,” Lectures 1-7, by Mark Lundstrom, 2009. http://nanohub.org/resources/7281 Lundstrom
questions 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom