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Nano-Carbon Materials: Fundamental Aspects and Applications

Nano-Carbon Materials: Fundamental Aspects and Applications. Alexander N. Obraztsov Faculty of Physics, Moscow State University E-mail: obraz@polly.phys.msu.ru. Russian-French Workshop on „Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005. Moscow State University.

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Nano-Carbon Materials: Fundamental Aspects and Applications

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  1. Nano-Carbon Materials: Fundamental Aspects and Applications Alexander N. Obraztsov Faculty of Physics, Moscow State University E-mail: obraz@polly.phys.msu.ru Russian-French Workshop on„Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005

  2. Moscow State University Department of Physics Russian-French Workshop on„Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005

  3. Synthesis Application Characterization Laboratory of Carbon Materials Nano-Carbon Russian-French Workshop on„Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005

  4. Mo cathode Plasma Substrate Chemical Vapor Deposition of Carbon Films Gas mixture: H2:CH4=10:1; Gas Pressure: P~10 kPa; Voltage: V~700V; Current: I~4 A; Substrate Size: 25x25 mm; Material: Si; Temperature: T~1000ºC Russian-French Workshop on„Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005

  5. Mo cathode Plasma Substrate Chemical Vapor Deposition of Carbon Films H2 CH4 CH + C2 Gas mixture: H2:CH4=10:1; Gas Pressure: P~10 kPa; Voltage: V~700V; Current: I~4 A; Substrate Size: 25x25 mm; Material: Si; Temperature: T~1000ºC [Carbon 41 (2004) 836] Russian-French Workshop on„Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005

  6. Chemical Vapor Deposition of Carbon Films Raman spectrometer Jobin Yvon U1000 Cu-vapor laser Spectrometer OceanOptics HR4000 Current source CH4 H2 Rotary pump Russian-French Workshop on„Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005

  7. Chemical Vapor Deposition of Carbon Films Russian-French Workshop on„Nanoscience and Nanotechnologies” , Lile, France, August 29-31, 2005

  8. In-situ optical characterisation of DC discharge plasma Typical images of dc discharges taken for pure hydrogen (a) and hydrogen-methane gas mixtures with 8% (b) and 25 % (c) of CH4. The total gas pressure is 80 Torr. Si wafer of 50 mm in diameter is used as a substrate, which is located on the anode in CVD reactor chamber. The images are obtained at voltages 650 V (a), 750 V (b), 850 V (c). The discharge current is 7 A (a), 6 A (b), and 5 A(c).

  9. In-situ OES of DC discharge in H2:CH4 Typical OES for pure hydrogen (a) and for hydrogen-methane gas mixture with 10% (b) and 25% (c) of methane. Total gas pressure is 80 Torr, applied voltage is 650 V (a), 750 V (b), 850 V (c). The discharge current is 7 A (a), 6 A (b), and 5 A(c).

  10. Model of nano-graphitic carbon deposition C2 C2 C2 1 5 2 3 4 Initial C2 nuclei on the subtstrate surface may form atomic chains rather than plates due to orientation of unsaturated carbon bonds. Than formation of tiny graphite crystallites and is possible. CNT formation may be initiated by the nano-crystallite curvature at initial stage or after reaching of some critical height. 1 2 3 4 5

  11. Nano-graphitic carbon structure peculiarities SEM image of a conical scroll on surface of nanostructured graphite-like CVD film. The inner part of the scroll is seen trough the outer layer indicating on its very small thickness.

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