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A systematic procedure for the development of hardened technology: application to the I3T80-HR

A systematic procedure for the development of hardened technology: application to the I3T80-HR. Karl Grangé – SODERN Karl.grange@sodern.fr. Agenda. Collaboration Initial specifications Initial philosophy: why to harden? The proposed procedure step by step: Technology selection

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A systematic procedure for the development of hardened technology: application to the I3T80-HR

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  1. A systematic procedure for the development of hardened technology:application to the I3T80-HR Karl Grangé – SODERNKarl.grange@sodern.fr

  2. Agenda • Collaboration • Initial specifications • Initial philosophy: why to harden? • The proposed procedure step by step: • Technology selection • Hardening techniques • Hardening against TID • Hardening against latch-up • Design kit development • First application: the SPADA_RT ASIC • Total dose evaluation • Latch-up evaluation • Analog SET evaluation • Distribution of the I3T80-HR technology AMICSA’2006 – SODERN

  3. Collaboration • This project is an ESA co-funded contract (TOS-EDP): • VPC2 project, contract n°18082/04/NL/CB • All hardening tasks performed have been done with the support of the CEA (French atomic agency) of Bruyères-Le-Châtel (SEIM) AMICSA’2006 – SODERN

  4. Initial specifications • Specifications are issued from the VPC2 project: • Develop a multi sensor acquisition board, able to be inserted in a SpaceWire/RMAP platform • The heart of this acquisition module is a high accuracy / medium speed ASIC called SPADA_RT (Signal Processing ASIC for Detector Array – Radiation Tolerant). • Issued from SPADA_RT specifications, hardening task objectives can be summarized as follow: • Latch-up threshold: > 80Mev/mg.cm² • TID hardness: > 60Krad(Si) • Life time: > 10-15 years • Considering strong economic pressure, use only commercial CMOS technologies • Hardening By Design (none extra cost allowed) • European factory • MPW / MLM facility for space user (low volume) AMICSA’2006 – SODERN

  5. Initial philosophy • Hardening By Design (HBD) seems the ideal approach when dealing with radiations for space use (moderate environment)… • Lower cost / higher flexibility compared to dedicated technology • State of the art performances • … but in practice, comparison with dedicated technology costs is not evident: • Time needed to design test vector (including software) • Time and set-up costs for testing • Time needed to exploit test results. • Conclusion: the following approach has been chosen • Sub-micron technology + moderate environment = HBD a priori, without test vector. • To limit risks, all hardening technique used shall be quantified, even roughly. AMICSA’2006 – SODERN

  6. Open point #1: why is it necessary to harden? • Decision to harden has been taken following 3 criteria: • High reliability with multi-mission specifications • Latch-up free • Degradation due to total dose Is it a real issue? • Typical dose level for : • GEO • 4mm of Al • Is about ~20Krad(Si)/year, which induces a dose rate of 2Rad(Si)/h. With a typical 0.35µm technology Vth ~10mV@100Krad(Si) Could modern processes be considered radiation tolerant? 1) Low oxide thickness 2) Low dose rate AMICSA’2006 – SODERN

  7. Open point #2: why is it necessary to consider dose (1)? • The radiation effect shall not be considered only from the TID point of view: • Degradation is time dependent. • Degradation is temperature dependent. • Degradation is dose rate dependent. • Considering only TID at low dose rate will ignore the leakage current failure mode: • Low dose rate naturally increases the reliability by about 5 for the same TID Transistor threshold voltage variation • The transistor is less conductor: • Timing failure Low Dose Rate TID High Dose Rate • The transistor is more conductor: • Leakage failure AMICSA’2006 – SODERN

  8. Gate oxide: none relevant degradation up to 100Krad(Si) Bird beak : Radiation hardness depend of its characteristics Field oxide: lack of isolation between 3-10Krad(Si) Open point #2: why is it necessary to consider dose (2)? • The conventional NMOS transistor is not hardened against leakage current failure mode: • Failure appears in the bird beak zone, side of the transistor itself. • The bird beak oxide thickness increases from the gate oxide thickness (7nm) up to field oxide thickness (~500nm): determination of its radiation hardness is very complex. • Hardening By Design can address leakage current but not threshold voltage increasing. AMICSA’2006 – SODERN

  9. Open point #2: why is it necessary to consider dose (3)? • Conclusion (0.35µm and lower technology considered): • Test at low dose rate = only failure related to threshold voltage increasing addressed. • Test at high dose rate = both leakage current failure (after radiation) and threshold voltage increasing failure (after annealing) are addressed. • To address leakage current failure, it is necessary to harden. XILINX VIRTEX FPGA vs total dose (0.25µm) Thermal failure Failure level Strongly FPGA code dependent !!! AMICSA’2006 – SODERN

  10. Open point #2: why is it necessary to consider dose (4)? • In space environment, some TID sources are issued from discrete events: • Passage through the trapped particles belts and polar zones for LEO. • Solar flares for GEO and extra planetary missions. • It means that the dose rate can be transiently high. x10000 The solar eruption that took place in August 1972 (> 30Mev) Measured solar protons flux (10MeV & 30MeV) between 1965 and 1985 (continuous line = Wolf law) AMICSA’2006 – SODERN

  11. 1g/cm² -> 4mm Al Open point #2: why is it necessary to consider dose (5)? • Practical example: The BEPI-COLOMBO mission • Mercury: 0.35UA + very low magnetic field = GEO solar flare x 10. • In GEO solar flare environment, the worst case for dose rate is an Anomalous Large (AL) protons solar flare: • 5Krad(Si) / 1 day -> 200rad(Si)/h behind 4mm of Al • It means that the need for the BEPI-COLOMBO mission considering only large solar protons flares behind 4mm of Al without margins is: • 50Krad(Si) for 1 large protons flare with 2Krad(Si)/h of dose rate. • 100Krad(Si) for 2 larges protons flares with 2Krad(Si)/h of dose rate… • Computation with the software “Space Radiations (v.5.0)” of some protons solar flares: • August 1972: 240rad(Si)/h behind 4mm of Al • October 1989: 110rad(Si)/h behind 4mm of Al AMICSA’2006 – SODERN

  12. Open point #2: why is it necessary to consider dose (6)? • Are large protons flares rare? In red: maximum solar cycle AMICSA’2006 – SODERN

  13. Open point #2: why is it necessary to consider dose (7) ? • Thus, it is necessary to harden against TID because: • It’s bringing reliability margin. • All failure modes are addressed. • High level of total dose and dose rate tolerance is also minimizing shielding requirement (low mass / volume) and simplify ray tracing consideration. • Low level of high dose rate tolerance need a refined mission analysis. • Where is the frontier between high and low dose rate? • Technology dependent (oxide thickness, quality…) • Complex simulations needed • Only some certitudes: • 10Krad(Si)/h -> high dose rate • 100Rad(Si)/h -> low dose rate AMICSA’2006 – SODERN

  14. Open point #2: why is it necessary to consider dose (8) ? • How to apply standards? • Low dose rate windows: • Earth missions • Worst case for bipolar transistors • ECSS 22900: 36-360rad(Si)/h • MIL.STD.883F method 1019.6: < 0.1rad(Si)/s • High dose rate • Extra-planetary mission • Worst case for MOS transistors: • ECSS 22900: 3-30Krad(Si)/h • MIL.STD.883F method 1019.6: 50-300rad(Si)/s AMICSA’2006 – SODERN

  15. Hardening procedure: general guidelines • Used approach • Use a systematic approach: • Prevent any marginal cases • Reaction against technology disappearance • None local optimization, taking into account biasing current, function… • Use all known hardening measures, with a « light » approach: • None test vector • None new techniques • Risk management about the light approach • Limit the temperature range (latch-up). • None memory point (SEU). • None bipolar structure. • Choice of the technology is part of the hardening procedure • « Light » environmental specifications (60KRad / 80MeV/mg.cm²) AMICSA’2006 – SODERN

  16. Technology selection criterion (1) • Economic consideration • Exclusive supplier of a « big » customer • Market (HV, OPTO, OTP… options) • Second source, introduction year • Distribution (MPW ? Number of run per year ?) • Electrical performances • Simulate some representative cases • Identify and quantify critical parameters (channel length, current density…) • Specific needs (analog capacitors…) • Intrinsic radiation level estimation • Intrinsic total dose level estimation: • Gate oxide thickness, voltage threshold, kind of isolation... • Intrinsic latch-up level estimation • EPI characteristic, isolation, Twin Tub, temperature range, diffusion depth, retrograde wells… • Technological characteristics allowing usual efficient countermeasures: • Buried layer, Shottky module, number of metal tracks AMICSA’2006 – SODERN

  17. Technology selection criterion (2) • Subjective approach shall be avoided (the smallest, the fashion technology…) • Ex: XFAB 1µm  certainly the best choice for latch-up, life time and reliability but incompatible with the electrical need. • Point attribution procedure concerning 21 criterion in the previous 3 categories has been established: • Elimination: incompatibility with the application. • Negative point: hypothesis done in the initial analysis were optimistic on this point. • Null: conform to the initial analysis • Positive point: Real advantage compared to the initial analysis. for each criteria, an “ideal” response shall be prepared. AMICSA’2006 – SODERN

  18. Technology selection criterion (3) Issued from economic analysis on life time Issued from economic analysis of project costs. Issued from initial analysis + simulations Extensive bibliography of well known hardening techniques Customer request Red = parameters with elimination condition AMICSA’2006 – SODERN

  19. Technology selection criterion (4) • This systematic procedure help to formalize the need. • All proposed parameters are accessible with a simple NDA. • The selected technology is the I3T80 CMOS 0.35µm from AMIS (ex ALCATEL). • The I3T80 is a hetero epitaxy process, which allow HV devices thanks to electrically isolated pocket • This kind of process is growing due to SoC applications. N-epitaxy NEPI NEPI Deep P-plugs allow electrical isolation (80V) of adjacent N-EPI pockets P-substrate AMICSA’2006 – SODERN

  20. Hardening technique: TID (1) • The following failure modes are addressed: • Device to device leakage current (NMOS): • Intra device leakage current (NMOS) AMICSA’2006 – SODERN

  21. Hardening technique: TID (2) • NMOS device to device leakage current is easily cancelled via systematic guard rings AMICSA’2006 – SODERN

  22. Hardening technique: TID (3) • For the intra device leakage current, a modified NMOS geometry is needed: • Classical circular geometry is not adopted because accurate electrical model can not be obtained without tests. • The geometry chosen is electrically 80% compatible with the classical geometry and its hardening level is compliant with 100Krad(Si). AMICSA’2006 – SODERN

  23. Hardening technique: TID (4) Geometry Electrical model Thanks to its great similitude with the classical geometry, an high accuracy is obtained on the electrical modeling “a priori”. AMICSA’2006 – SODERN

  24. Hardening technique: Latch-up (1) • As baseline, the proposed technology increases the latch-up hardening by a factor 6 if NMOS and PMOS transistors are manufactured in separated pockets. Parasitic SCR circuit AMICSA’2006 – SODERN

  25. Hardening technique: Latch-up (2) • In addition to the previous rule (NMOS & PMOS shall be manufactured in separated EPI pocket), others hardening rules are added (see initial philosophy): • Systematic guard ring around PMOS and NMOS • PMOS and NMOS above buried layer • Limit the transistor size • Limit the wells (buried layer) size • Purpose of size limiting rules is to prevent: • S/D junction turn ON for transistor sizing limitation • Wells junction turn ON for NWELL or PWELL sizing limitation In case of ion strike. • Sizing limitation is computed with analytical models. AMICSA’2006 – SODERN

  26. Hardening technique: Latch-up (3) • Cross-section with hardening rules: • NMOS and PMOS in separated N-EPI pocket • NMOS and PMOS wells above buried layer • NMOS and PMOS have maximum dimension • NMOS and PMOS wells have maximum dimension AMICSA’2006 – SODERN

  27. Hardening technique: Latch-up (4) • Sub-model 1: Layer isolated by junction is used to fix the maximum transistor size. • Sub-model 2: layer above a low impedance buried layer with the same polarity (N or P) used to fix the maximum wells dimension: 2.R1max S/D diffusion POLY gate Guard ring Sub-model1: Transistor size Charges (ion) Buried layer NPLUG NEPI 2.R2max Wells (N or P) Sub-model1: Wells size AMICSA’2006 – SODERN

  28. Practical implementation of hardening rules • Practically and to prevent weak points, a new design kit has been coded with all hardening rules (ESD pads included) • Compared to the original one, the following modifications have been done: • Unused elements removed (front and back end) • MOS electrical models modified • MOS geometries modified • DRC rules modified (latch-up rules + detection of removed elements) • Extraction rules modified (mainly for NMOS extraction) • Basic library modified (ESD pads) • Digital gates redesigned • 17 months have been necessary for: • Technology selection • Hardening rules • Design kit coding • SPADA_RT chip design and test AMICSA’2006 – SODERN

  29. First application: the SPADA_RT • The proposed flow have been validated with the development of an mixed ASIC. • SPADA_RT = Signal Processing ASIC for Detector Array _ Radiation Tolerant. • Multi sensor chip: CCD, APS, HgCdTe • Include all necessary circuitry for sensor / house keeping conditioning (ADC excluded) • Both electrical and environmental specifications have been met at the first run. AMICSA’2006 – SODERN

  30. SPADA_RT TID results (1) • TID evaluation of the SPADA_RT has been done at PAGURE (France) facility. • Method used is the ESCC.22900 method: • Standard windows • 10Krad(Si)/h • 5 steps: 0Krad(Si), 30Krad(Si), 60Krad(Si), 120Krad(Si) and annealing. • 5 dies • None functional or specification failure has been measured. AMICSA’2006 – SODERN

  31. SPADA_RT TID results (2) AMICSA’2006 – SODERN

  32. Specie Angle Flux (p/(cm².s)) LET (Si) Penetration (µm) C 0° 1E7 1.2 Mev/mg.cm² 266 Ne 0° 1E7 3.3 Mev/mg.cm² 199 Ar 0° 1E7 10.1 Mev/mg.cm² 120 Ni 0° 1E7 21.9 Mev/mg.cm² 85 Kr 0° 1E7 32.4 Mev/mg.cm² 92 Kr 60° 1E7 64.8 Mev/mg.cm² 46 SPADA_RT latch-up results • Test set-up: • Power supplies: +3.3V +/-2% • Number of DUT: 5 • Temperature: +25°C +/- 2°C • Die pixel frequency: 120KHz • Location: LOUVAIN (CYCLONE) • Heavy ions cocktail: See the next table. • None latch-up detected. AMICSA’2006 – SODERN

  33. SPADA_RT analog SET results • A complete characterization of analog Single Effect Transient (Analog SET) have been done: • Event = upset of +/-25mV around the steady state value (better accuracy is not possible due to the noisy environment) AMICSA’2006 – SODERN

  34. I3T80-HR distribution (1) • In accordance with ESA, this technology is now available for all potential ESA users: • MPW facilities always accessible • SODERN / EUROPRACTICE kit distribution (under analysis) • The nominal kit is available under HyperSilicon software suite (TANNER) • Low cost • New verification suite include is compatible with CALIBRE • Digital & analog library accessible (including the SPADA_RT) • In addition of this nominal kit, an innovative distribution flow called Netlist-to-layout is also accessible: • From our library, the user develops the front end, SODERN make the back end, up to the tape out, • User do not need any specific software or competences: he simply uses a low cost simulator (PSPICE, HSPICE…). • Similar digital flow in 2007. AMICSA’2006 – SODERN

  35. I3T80-HR distribution (2) AMICSA’2006 – SODERN

  36. End • Thank you for your attention. Karl Grangé – SODERNKarl.grange@sodern.fr AMICSA’2006 – SODERN

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