Doped polysilicon - PowerPoint PPT Presentation

Presentation of Activities of GM 2001-2002

Institut d’Electronique et Télécommunications de Rennes IETR UMR CNRS 6164 . Groupe de Microélectronique (GM) Pôle du CNFM : Centre Commun de Microélectronique de l’Ouest Campus de Beaulieu 35042 Rennes Cedex France. Presentation of Activities of GM 2001-2002. Prof. Olivier Bonnaud

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Silicon Substrate

Silicon Substrate. Add nitride. Silicon Substrate. Add Poly0. Patterned Photoresist. Silicon Substrate. Patterning through 1st level mask (Poly0) using Photolithography. Photoresist. Patterned Photoresist. Silicon Substrate. Removal of Unwanted Poly0 using Reactive Ion Etching.

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