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Deep UV-Blocking Particle Filter Using High Aspect Ratio Si Nanogratings with Smooth Sidewalls

Deep UV-Blocking Particle Filter Using High Aspect Ratio Si Nanogratings with Smooth Sidewalls. Pran Mukherjee, Thomas H. Zurbuchen, L. Jay Guo, and Fred A. Herrero. Outline. Introduction to Application Summary of Fabrication Techniques Review of NIL/DRIE Technique Conclusion.

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Dry etch mask oxide - PowerPoint PPT Presentation

Deep UV-Blocking Particle Filter Using High Aspect Ratio Si Nanogratings with Smooth Sidewalls