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Chapter 2

Chapter 2

Chapter 2 Manufacturing Process and CMOS Circuit Layout 1 st rev. : March 7, 2003 2 nd rev. : April 10, 2003 CMOS Process A Modern CMOS Process Dual-Well Trench-Isolated CMOS Process The Manufacturing Process

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Lecture 2 State-of-the art of CMOS Technology

Lecture 2 State-of-the art of CMOS Technology

Lecture 2 State-of-the art of CMOS Technology. The CMOS Transistor. L. Gate oxide. Polysilicon Gate. W. Source. Drain. Field-Oxide (SiO 2 ). n+. n+. p substrate. Bulk (Body). The NMOS Transistor Cross Section. Self-Aligned Gates NMOS Process.

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464 views • 39 slides
Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. Manufacturing Process. July 30, 2002. CMOS Process. A Modern CMOS Process. Dual-Well Trench-Isolated CMOS Process. Circuit Under Design. Its Layout View. The Manufacturing Process.

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532 views • 37 slides
Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. Manufacturing Process. July 30, 2002. CMOS Process. A Modern CMOS Process. Dual-Well Trench-Isolated CMOS Process. Circuit Under Design. Its Layout View. The Manufacturing Process.

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529 views • 37 slides
Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. Manufacturing Process. July 30, 2002. CMOS Process. A Modern CMOS Process. Dual-Well Trench-Isolated CMOS Process. Circuit Under Design. Its Layout View. The Manufacturing Process.

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616 views • 37 slides
Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. Manufacturing Process. July 30, 2002. CMOS Process. A Modern CMOS Process. Dual-Well Trench-Isolated CMOS Process. Circuit Under Design. Its Layout View. The Manufacturing Process.

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570 views • 36 slides
CMOS Process

CMOS Process

Manufacturing Process. CMOS Process. A Modern CMOS Process. Dual-Well Trench-Isolated CMOS Process. Circuit Under Design. Its Layout View. The Manufacturing Process. For a great tour through the IC manufacturing process and its different steps, check

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1.09k views • 36 slides
Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective. Manufacturing Process. July 30, 2002. CMOS Process. A Modern CMOS Process. Dual-Well Trench-Isolated CMOS Process. Circuit Under Design & Layout View. Photo-Lithographic Process. optical. mask. oxidation. photoresist.

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523 views • 33 slides
A Modern CMOS Process

A Modern CMOS Process

A Modern CMOS Process. Observe parasitic capacitances! Cap from gate to channel. Cap from gate sidewall to source or drain. Cap from bottom of drain diffusion to well. Cap from sidewall of drain to well (small with STI). Dual-Well Trench-Isolated CMOS Process. Epi on p+ substrate shown.

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754 views • 6 slides
A Modern CMOS Process

A Modern CMOS Process

A Modern CMOS Process. Observe parasitic capacitances! Cap from gate to channel. Cap from gate sidewall to source or drain. Cap from bottom of drain diffusion to well. Cap from sidewall of drain to well (small with STI). Dual-Well Trench-Isolated CMOS Process. Epi on p+ substrate shown.

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634 views • 6 slides

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