1 / 29

Overview

Overview. Economic Impact of Plasma Processes used in Microelectronics What is Plasma? Manufacturing Computer Chips Plasma Etching and Deposition The Future: Energy and Nanotechnology. FUNDAMENTALS OF SEMICONDUCTOR FABRICATION, May and Sze. Economic Impact.

vlad
Télécharger la présentation

Overview

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. Overview • Economic Impact of Plasma Processes used in Microelectronics • What is Plasma? • Manufacturing Computer Chips • Plasma Etching and Deposition • The Future: Energy and Nanotechnology

  2. FUNDAMENTALS OF SEMICONDUCTOR FABRICATION, May and Sze Economic Impact • $227B: The 2005 global revenue of semiconductor chip producers. • e.g., Intel, AMD, Samsung,… • About one-half of the procedures to make a chip require the use of plasmas.

  3. Lighting Plasma Television Biomedical E. coli Environmental Other Uses of Plasma Source: www.plasmacoalition.org/publications.htm

  4. Plasma: an ionized gas consisting of atoms, electrons, ions, molecules, molecular fragments, and electronically excited species (informal definition) www.geo.mtu.edu/weather/aurora/ www.plasmacoalition.org

  5. plasma (electrons+ions) energy Temps > 10,000oK >99% of the matter in the universe gas (steam) energy energy liquid (water) Plasma:the “fourth state of matter” solid (ice)

  6. Often, electrical energy is used to create a plasma - + - battery

  7. ”sputtering” + + + + - - - - - + - - - - - - + - - Argon Electron (-) Argon ion (+) Source: www.plasmacoalition.org - + Simple Plasma Generation- adding energy to gas - Argon + Mercury @ ~0.004 atm. - + High Voltage - + A common fluorescent light contains around 10,000,000,000,000 electrons and ions This is also at the heart of high power gas lasers.

  8. Microfabrication:Making Computer Chips Computer chips are made like a layered cake, but with the unwanted parts of each layer removed. To create the complex 3-dimensional structure, a sequence of adding a layer and etching away the unwanted parts is repeated many times – as shown next:

  9. Microfabrication:Starting with the Wafer

  10. Microfabrication:Plasma Deposition of Glass (SiO2)

  11. Microfabrication:Application of Photoresist (Film)

  12. Microfabrication:Gas Plasma Laser Patterning of Photoresist photomask

  13. Microfabrication:Developing the Photoresist Film (Etch Mask)

  14. Microfabrication:Plasma Etching of Glass

  15. Microfabrication:Etching of Photoresist (Ashing)

  16. Microfabrication:Deposition of Metal (Wires): Plasma Sputtering and Electroplating

  17. Microfabrication:Polishing Excess Metal (CMP)

  18. Microfabrication:Repeat this sequence: The first four layers

  19. www.kostas.neu.edu Plasma Etching Equipment

  20. Cl2 Cl2 SiCl2 Cl+ SiCl2 Cl Plasma Etching Vacuum Chamber Chlorine Plasma - + High Voltage at Radio Frequency

  21. Plasma Etching Plasma Etching Wet Etching (in acid) Cl+ Cl wafer wafer negative voltage Si(s) + 2Cl(g)+ ion energy  SiCl2(g) The directional ion energy drives the chemical reaction only at the bottom of the microscopic feature. In wet chemistry, the chemical reaction occurs on all surfaces at the same rate. Very small features can not be microfabricated since they eventually overlap each other.

  22. Scanning Electron Microscope Photographs of Plasma Etched Microstructures: 500 times smaller diameter than a hair Jason M. Blackburn, David P. Long, Albertina Cabañas, James J. Watkins Science 5 October 2001: Vol. 294. no. 5540, pp. 141 - 145

  23. Plasma Deposition (of SiO2)Etching in Reverse SiH4 H2+H2O H2 SiHx H2O O2 O2 S

  24. Plasma Deposition Equipment Source: S.A. Campbell (Oxford Press, 2001)

  25. The Future “Transistor Elements for 30nm Physical Gate Lengths and Beyond,” B. Doyle, et al. 20 atoms wide! http://developer.intel.com/technology/itj/index.htm

  26. High-efficiency solar cells using silicon nanodots http://www.me.umn.edu Low-cost solar cells Low power microplasmas for hand-held toxic gas sensors Energy, Nanotechnology, and the Environment

  27. Conclusion • Plasma, the fourth state of matter, plays a crucial role in the microelectronics industry  Plasma enables us to create extremely small circuits • Faster, smarter, and cheaper electronics • Plasma science and engineering help us understand how plasmas behave and allow us to harness the potential of plasma for new and exciting technologies

  28. Questions and Comments Speaker Contact Information: Jeffrey A. Hopwood Professor of Electrical and Computer Engineering Tufts University Medford, Massachusetts hopwood@ece.tufts.edu Coalition for Plasma Science www.plasmacoalition.org

More Related