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Semiconductor Devices Lecture 5, pn-Junction Diode

Semiconductor Devices Lecture 5, pn-Junction Diode. Content. Contact potential Space charge region, Electric Field, depletion depth Current-Voltage characteristic Depletion layer capacitance Diffusion capacitance Transient Behavior Junction Breakdown.

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Semiconductor Devices Lecture 5, pn-Junction Diode

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  1. Semiconductor Devices • Lecture 5, pn-Junction Diode

  2. Content • Contact potential • Space charge region, Electric Field, depletion depth • Current-Voltage characteristic • Depletion layer capacitance • Diffusion capacitance • Transient Behavior • Junction Breakdown

  3. Contact potential, in Equilibrium and without applied voltage

  4. Contact potential, in Equilibrium and without applied voltage Current density is =0 Einstein- relation

  5. Contact potential, in Equilibrium and without applied voltage

  6. Contact potential, in Equilibrium and without applied voltage

  7. Contact potential, in Equilibrium and without applied voltage

  8. Space charge region, Electric Field Poisson’s ekvation Only fixed charge is used!

  9. Space charge region, Electric Field

  10. Space charge region, Electric Field The area under E(x) xn0Nd=xp0Na, W=xn0+xp0 Contact potential expressed in doping level and depletion depth

  11. Space charge region, depletion depth What happened with xp0 and xn0 if Na or Nd is large?

  12. Current-Voltage characteristic

  13. Current-Voltage Characteristic Forward biased junction: Diffusion current increase. The drift currents are almost constant

  14. Current-Voltage Characteristic Reverse biased junction: Diffusion current decrease. The drift currents are almost constant

  15. Current-Voltage Characteristic, forward bias junctions

  16. Current-Voltage Characteristic Generation of charge carrier in the depletion region as well as charges diffuse into the junction, swept through the depletion layer by the electric field, result into a leakage current of the device

  17. Current-Voltage Characteristic, injection of minority carrier (forward bias) • Contact potential caused by a different concentration across the junction • With bias applied 1/2 gives

  18. Current-Voltage Characteristic, injection of minority carrier (forward bias) Subtracting equilibrium hole and electron conc. Diffusion length

  19. Current-Voltage Characteristic, injection of minority carrier (forward bias) Hole diffusion current at point xn Hole current injected into the n-material Electron current injected into the p-material

  20. Current-Voltage Characteristic, the diode equation. Total current at xn=xp=0 Voltage depended minority injection included

  21. Current-Voltage Characteristic, the diode equation. Reversed bias! Increasing Vr gives: Shockley Equation Good agreement for Ge. Bad for Si

  22. Current-Voltage Characteristic, the diode equation. The current is constant through the component The doping affect the injection The p-doping is higher than the n-doping which gives a bigger hole injection

  23. Current-Voltage Characteristic, reverse biased junction

  24. Current-Voltage Characteristic, reverse biased junction

  25. Current-Voltage Characteristic, 2 order effect • Generation and recombination in the depletion volume • Ohmic losses

  26. Current-Voltage Characteristic, 2 order effect Recombination center in the bandgap. In reverse bias mode the center act as a generations center, which affect the leakage current. (b) Thermal generation of carrier in neutral region (a)

  27. Current-Voltage Characteristic, 2 order effect • The diode equation is modified to take care of the effect of recombination. An ideality factor n with a value from 1 to 2, is therefore introduced. 1 is pure diffusion and 2 is pure recombination. A real diode is somewhere in-between. • I0’ is modified to better explain the current when recombination/generation center affect the leakage current. Generation life-time in depletion region Minority carrier lifetime in neutral n-doped region (p+n-diode)

  28. Ohmic losses V Va

  29. Depletion layer capacitance Def. of Capacitance 0 V bias

  30. Depletion layer capacitance Equal amount of charge on each side, opposite charge Propagation of depletion region caused by the doping Differentiation gives the junction capacitance. The capacitance is voltage dependent and decrease with increased reverse bias Can be written as a simple plate capacitor

  31. Depletion layer capacitance

  32. Depletion layer capacitance

  33. Depletion layer capacitance s Si: Ks=12

  34. Diffusion capacitance Long diodes, The diode is longer than the diffusion length for the minority carrier, no contribution to the capacitance Short diodes, the most silicon diodes behave as short diodes Storage length

  35. Transient Behavior Injection of minority carrier, when the diode is forward biased. p+n-diode

  36. Transient Behavior After injection of carrier, the diode is reversed biased. The diode conduct until all injected carrier have recombined.

  37. Junction Breakdown • Zener breakdown • Avalanche breakdown

  38. Junction Breakdown, zener n and p are doped high, which result in tunneling through the potential barrier Negative temp. coeff Vb T

  39. Junction Breakdown, Avalanche An electron is accelerated in a high electric Field , which gives impact ionization. Positive temp coeff.

  40. Junction Breakdown, PIN-diode

  41. Junction Breakdown, avalanche in surface

  42. Junction Breakdown, avalanche in surface High Electric Field SiO2 + + + + + + + + + + + + p - - - - - - - - - - - - Low doped n n+

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