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EELS (electron energy loss spectroscopy): electron populations and excitations involved

2.5. unoccupied. Plasmon. Core loss. conduction. mode. states. Low loss. CK. Low loss. 2.0. Intensity (nber of counts x 10 6 ). 1.5. 0. 10. 20. 30. 40. c. ). MnL 2,3. Energy-loss (eV). Core loss. (L edge). Core loss. 1.0. CK. (K edge). 2p core. MnL 2,3. states. 0.5.

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EELS (electron energy loss spectroscopy): electron populations and excitations involved

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  1. 2.5 unoccupied Plasmon Core loss conduction mode states Low loss CK Low loss 2.0 Intensity (nber of counts x 10 6) 1.5 0 10 20 30 40 c ) MnL2,3 Energy-loss (eV) Core loss (L edge) Core loss 1.0 CK (K edge) 2p core MnL2,3 states 0.5 630 640 650 660 670 680 690 x106 x50 Energy-loss (eV) 0 500 0 100 200 300 400 600 700 250 300 350 400 1s core states Energy-loss (eV) Energy loss (eV) EELS (electron energy loss spectroscopy): electron populations and excitations involved E F

  2. 20 nm Spectrum line 0- (nm) 4 0- I I I I 250 300 350 400 Energy Loss (eV) The spectrum image mode EELS spectrum B A HADF image 0.5 to 0.8 eV 1ms to 10s Spectrum Magnetic spectrometer E o C amera CCD E - E D o HADF detectors A Specimen Probe Scanning coils • 0.1 to 1nA • in 0.5 to 1 nm 100 keV B Field emission gun

  3. Introduction Liquid Metal Ion Source (LMIS) is used to generate an ion beam. Ga+ ions are rastered across a specimen and secondary electron / ion signals are collected by a detector. The ion beam is focused through a series of lenses and concentrated at a focal point through an aperture. • Large stage systems: • 200mm stage DualBeam • 300mm stage DualBeam

  4. Introduction Conductors and insulators can be deposited by using different gases. Gas-enhanced etching is efficient for removing large volumes of material and is chemistry-specific Chemical reactions can be induced between adsorbed gas and substrate particles

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