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Contrast Properties of Electron Beam Resist

Contrast Properties of Electron Beam Resist. Ahmed Al Balushi. Overview. Resist materials Sensitivity Contrast Development curves Resist contrast Conclusion Q&A . Resist Materials. Important properties of resist are: Sensitivity Contrast Linked to resolution capability of resist.

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Contrast Properties of Electron Beam Resist

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  1. Contrast Properties of Electron Beam Resist Ahmed Al Balushi

  2. Overview • Resist materials • Sensitivity • Contrast • Development curves • Resist contrast • Conclusion • Q&A

  3. Resist Materials • Important properties of resist are: • Sensitivity • Contrast • Linked to resolution capability of resist

  4. Sensitivity and contrast are derived from a resist development curves Resist A has higher contrast Resist A has higher sensitivity

  5. Development Curves • development curves, also called contrast curves, are obtained by exposure and development of a series of large square patterns with different exposure doses • The remaining resist thickness is measured against the exposure dose, which generates the development curves

  6. Resist Contrast • Resist contrast is defined by the slope of a development curve and expressed as: where • D1 is the exposure dose at which the resist is fully exposed • D0 is the exposure dose at which the resist starts to be exposed • The steeper the slope, the higher the resist contrast

  7. Resist Contrast • The steeper the slope is, the higher the resist contrast. • Resist contrast is an inherent property of a resist material. However, development conditions can have some influence on it.

  8. Development curves of HSQ negative-tone resist exposed at different e-beam energies Contrast curve of SU-8 resist

  9. Resist contrast • By the appearance of contrast curves of these two resists, one can immediately tell that the HSQ resist has higher contrast. • The contrast of negative-tone resist HSQ is 2.8 • Another negative-tone resist, SU-8, has a contrast of only 0.92, as measured from contrast curve shown in the figure

  10. Resist Contrast • Apart from measuring the slope of resist contrast curves, another direct way of judging the resist contrast is to observe the resist profile after development. High contrast resist

  11. Resist contrast • High contrast is always desirable because: • It enables resist profiles after development to have vertical sidewalls and high aspect ratios • Facilitate pattern transfer • Enable lithography of high density patterns

  12. Thank YouQ&A

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