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CMOS for Power Device

2004-1 Microwave Device Term Project. CMOS for Power Device. 전파공학 연구실 2003-21576 노 영 우. Outline. RF Performance of CMOS. RF CMOS Modeling. Problem of CMOS for Power device. Power performance of CMOS. Solution for CMOS Power Amplifier. Conclusion. RF CMOS is optional

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CMOS for Power Device

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  1. 2004-1 Microwave Device Term Project CMOS for Power Device 전파공학 연구실 2003-21576 노 영 우

  2. Outline • RF Performance of CMOS • RF CMOS Modeling • Problem of CMOS for Power device • Power performance of CMOS • Solution for CMOS Power Amplifier • Conclusion

  3. RF CMOS is optional • Much work • Sufficient design enviroment • RF CMOS Tech. Inductor, MIM, Varactor • How many product ! • No commercial • Handle design for CMOS RF/Analog/Digital chip • Much work for CMOS PA Integration • RF CMOS ? • Few works in Device modeling • Insufficient design environment • Digital CMOS Tech. • Most work from Univ. • CMOS PA (Study) • Only LDMOS , BV > 20V • Essential for low cost product • Provide design kit • model, layout DB • Deep well tech. • GSM phone (Si-lab) • 1.8 V/ 3.3 V & Circuit • below 200 mW is common Expectation of CMOS limit always changes with time - Enormous research, investment, engineers, foundry………. View of RF CMOS for System on a Chip 5~6 years ago 2~3 years ago Today

  4. RF performance of CMOS  RF performance of Active Device Performance • 0.18 CMOS shows 150 GHz fmax • 0.05 um SOI of CMOS - fT of 178 GHz - fmax of 193 GHz • Comparable with SiGe HBT Technology - fmax of 240 GHz Ref. : L. F. Tiemeijer, et al., ’01 IEDM, Secession 10-4 S. Narasimha, et al., ’01 IEDM, Secession 29-2

  5. RF performance of CMOS  Device Performance with Scale-down  Fmax & Noise of CMOS  Inductor Q, linearity • Gm increase : improve fmax, Fmin, IP3 • Metal layer increase : improve inductor Q Ref. : SIA The national Technology Roadmap for Semiconductors, 1998 E.Moriuji, et al., Sysm. On VLSI Circuits, 1999

  6. RF performance of CMOS  Noise performance  NMOSFET vs PMOSFET • Two times lower fmax, fT compared with NMOSFET because of mobility (Transconductance) Ref. : C. S. Kim, et al., EDL, pp 607-609, Dec.2000

  7. RF CMOS Modeling • For successful RF circuit design, the proper prediction of  Frequency characteristics (fT, fmax)  Small signal modeling  Linearity characteristics (P1dB, IP3)  Large signal modeling  Noise characteristics (NF, Rn)  Noise modeling are required.  Basic CMOS model for RF  Limit of SPICE Model (BSIM3v3)  UC Berkeley Model  Limit in High freq. For Digital, low freq Analog Circuit Need Rg for S11, Rsub for S22

  8. What is the market asking for ? Distributed Active Transformer

  9. Problem of CMOS for PA  Unsuitable Device for PA ( High Knee Voltage )  For high efficiency, Vknee should be low, Vmax should be high (~BVdss ~ 2VDD)

  10. Problem of CMOS for PA  Unsuitable Device for PA ( Large Voltage Swing )  Load line for Pin=25 dBm  ~ 2Vdd BVdss of LDMOS ~ 20V, Unsuitable for integration  Oxide breakdoun limit  Hot carrier effect  Reliability limit  Excellent potential for 2~5 GHz wireless comm.

  11. Problem of CMOS for PA  Effect of Scaling on the Design of CMOS PA  As minimum channel length Lmin of MOS Tr scales down,  Reduced supply voltage ( 3.3 V for 0.35 um & 2.5 V for 0.25 um )  Required load resistance to be reduced  The smaller load resistance required for a down scaled CMOS technology results in larger power loss in the impedance matching network  lower efficiency “1 W still remains a challenge !”

  12. Power performance of CMOS  800 ~ 900 MHz  1700 ~ 1900 MHz

  13. Power performance of CMOS  2.4 GHz  5 ~ 5.3 GHz

  14. Power performance for Wfinger Device Size Load pull measurement • VDD = 3.0 V • Thick Oxide, L= 0.35 um • Current 22 mA

  15. Load Pull Measurement of Power Transistor Thick Oxide power transistor using 0.25 um @ 2 GHz @ 5 GHz • VDD = 3.0 V • Thick Oxide, L= 0.35 um

  16. Solutions for Large Swing (Case 1)  Thick Gate Oxide in 0.2 um CMOS ( Timothy C. Kuo, Philips, ISSCC’01 • A 1.5W Class F RF PA in 0.2 um CMOS • By using Thick Ox. : output node sustain 7 Vp <Cascode Topology> • Sine wave driver VS square wave driver • Inductor tuning driver: Negative swing  damage oxide • Higher efficiency in square driver case

  17. Solutions for Large Swing (Case 1)  Inverter Driven 2-stg Power Amplifier in 0.2 um CMOS • Class F: Resonate Co & Lo @ 2fo • Power control: Control the cascode bias • Class D, E (switching PA) : BVdss > 3.6 VDD • VDD (3V/1.8V), 900 MHz, 1.5W, PAE(43%), Class F

  18. Solutions for Large Swing (Case 2)  Self-biased Cascode 0.18 um CMOS ( Tirdad Sowlati, Philips, ISSCC’02 ) • DC of D2 and G2 : same • Bias for G2 is provided by Rb /Cb • Rb /Cb is chosen for Equal gate-drain signal swing on M1 and M2

  19. Solutions for Large Swing (Case 2)  Self-biased Cascode 0.18 um CMOS ( Tirdad Sowlati, Philips, ISSCC’02 ) • Inter stage LC, Output MN (off chip) • VDD=2.4 V, Po= 23.5 dBm, PAE(45%), Gain 38 dB • Hot carrier degradation @ 23.5 dBm (6 days)  23.4 dBm

  20. 5 GHz CMOS Power Amplifier (Case 3)  802.11a WLAN ( David Su, Atheros, ISSCC’02 ) • Fully differential Class A • 0.25 um CMOS, 3.3 V, 190 mA • 22 dBm

  21.  Highly linear PA for OFDM  Single power supply 3.3 V  Small size package with heat sink Multi-Band/ Mode CMOS PA  Dual Band PA ( WLAN Application )

  22. Conclusion • CMOS is most unsuitable device for power amplifier, but much works to integrate the PA will be continue. • Good performance RFIC ~ Good active device design • Library is not sufficient for high performance IC design. • 802.11 a/b/g low power, multi-band, multi-mode PA application - High integration level

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