40 likes | 161 Vues
The 2004 ITWG Meeting in Stresa, Italy, focused on critical technology challenges within the semiconductor industry, chaired by Peter M. Zeitzoff. Key discussions included DRAM half-pitch projections, scaling comparisons between DRAM and flash technologies, and increasing maximum 3-sigma variation in chip design. The meeting emphasized the importance of collaboration with other TWGs to assess transistor characteristics and address power dissipation and leakage current requirements for low-power logic. Participants included industry experts from leading tech companies and universities.
E N D
2004 ITWG Meeting Stresa, Italy April 20, 2004 PIDS Key Issues Peter M. Zeitzoff US Chair
Participants: this ITWG • Liko Beldi (ST Microelectronics) • Simon Deleonibus (LETI) • Guillermo Bomchil (ST Microelectronics) • Jan-Erik Muller (Infineon) • Stefaan Deisuter (IMEC) • Kristin DeMeyer (IMEC) • George Bourianoff (Intel) • Ingmar Meijer (IBM) • Toshihiro Sugii (Fujitsu) • Yasuo Inoue (Renesas Technology) • Toshiro Hiramoto (Univ. of Tokyo) • Shinichi Takagi (Univ. of Tokyo) • Jim Hutchby (SRC) • Joe Brewer (Univ. of Florida) • Lalita Manchanda (SRC) • Kang Wang (UCLA) • Ming-Jinn Tsai (ITRI)
2004 update: no major changes anticipated updates and corrections DRAM half pitch: ’03 ITRS projection of 90 nm in 2004 appears likely 2005 ITRS CD control of Lg: proposed increase in maximum 3-sigma variation from 10% to 12% This is an inter-TWG and chip size study group issue: no decision yet PIDS will support other TWGs, especially Design Impact of the proposed increase on transistor characteristics, esp. Vt statisticalvariation Modeling and Simulation TWG may be able to help Scaling of feature size to be re-evaluated for both DRAM and flash Is flash scaling catching up with, surpassing DRAM scaling? Key PIDS Issues
2005 issues (con’t.) Logic: scaling goals, models, and results to be reviewed, updated Maximum leakage current requirements, particularly for low-power logic With Design TWG: evaluate scaling of power dissipation and related issues Improved models: capacitance, poly depletion and inversion layer effects, enhancements from advanced devices, etc. Timeline of potential solutions NVM: considering transfer of phase change and floating body memory from ERD section to PIDS tables Key PIDS Issues (continued)