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Explore the potential of 3D architectures for gigascale integration with a focus on interconnect optimization and wiring density limitations. This workshop presentation outlines the motivation, concepts, model derivation, results, and conclusions, shedding light on the benefits and challenges of implementing 3D integration.
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Opportunities for Gigascale Integration in Three Dimensional Architectures James Joyner, Payman Zarkesh-Ha, Jeffrey Davis, and James Meindl Microelectronics Research Center Georgia Institute of Technology SLIP Workshop 2000 9 April 2000 Supported by DARPA and SRC
Outline • Motivation • 3D Architecture Concepts • Derivation of 3D Model • Results of Model • Optimization of Interconnects • Wiring Density Limitations • Conclusions
Motivation • 10% of Interconnects = 80% of Wire Length. • KEEP INTERCONNECTS SHORT!!
Motivation • Each gate has more neighboring gates. 2D 3D
Motivation • Reduction of gate pitch due to smaller wire-limited area. 2D 3D
Outline • Motivation • 3D Architecture Concepts • Derivation of 3D Model • Results of Model • Optimization of Interconnects • Wiring Density Limitations • Conclusions
3D Architecture Concepts • Stratum - A layer of transistors with its tiers of interconnects. • Tier - A pair of orthogonal metal levels with equal pitch. Tier 2 Stratum 1 Tier 1 Tier 2 Stratum 2 Tier 1
3D Architecture Concepts • Stratal- to gate- pitch ratior. Stratum 1 Stratum 2
3D Architecture Concepts Importance of r • Height of metal stack is at least as great as the gate pitch (r > 1). • Substrate thickness for mechanical stability. • Thermal/electrical insulation of strata. • r affects the probability of running an interconnect vertically.
3D Architecture Concepts • Gate pair – two gates separated by a given manhattan length. • Length in manhattan geometry.
Outline • Motivation • 3D Architecture Concepts • Derivation of 3D Model • Results of Model • Optimization of Interconnects • Wiring Density Limitations • Conclusions
Derivation of 3D Model • Need two values. • Number of expected interconnects between a gate pair (probability of occupation). • Use Rent’s Rule. • Number of gate pairs (density of states). • Use discrete convolution.
Derivation of 3D Model Number of Expected Interconnects • Expression from Rent’s Rule. 2D B A B C 1D C B B C B C B C A B B C C
Derivation of 3D Model • Manhattan sphere instead of circles. 3 3 2 3 3 2 1 2 3 4 4 3 2 3 4 4 3 4 4
Derivation of 3D Model • Edge effects. Horizontal 3 3 2 3 3 2 1 2 3 4 4 3 2 3 4 4 3 4 4
Derivation of 3D Model 3 3 3 3 3 2 2 1 2 2 • Edge effects. Vertical 3 3 3 3 3 4 4 3 3 4 4 3 4 4
Derivation of 3D Model • Use of averaging to avoid both horizontal and vertical edge effects. • A function for the number of starting gates must be defined. Number of Gate Pairs Number of Starting Gates
Derivation of 3D Model • Starting gate – a gate that can serve as the NA of a gate pair for a given length. X X X X X 1D X Length = 5 2D X X X X X X X X X
Outline • Motivation • 3D Architecture Concepts • Derivation of 3D Model • Results of Model • Optimization of Interconnects • Wiring Density Limitations • Conclusions
Outline • Motivation • 3D Architecture Concepts • Derivation of 3D Model • Results of Model • Optimization of Interconnects • Wiring Density Limitations • Conclusions
Optimization Interconnect Distribution Area Required Dn Delay Equation Ln-1 Ln • Solve equations simultaneously. • pn is pitch required such that wire length Ln meets delay. • Ln is limited by the available area for a tier and the pitch.
Optimization 950 MHz Wire-Limited Area Metal Levels • 50% reduction in metal levels • 39% reduction in area • 92% reduction in area
Optimization Wire-Limited Clock Frequency • 14x increase in clock frequency • 63% reduction in area
Outline • Motivation • 3D Architecture Concepts • Derivation of 3D Model • Results of Model • Optimization of Interconnects • Wiring Density Limitations • Conclusions
Limitations Vertical Wiring Density Pad - Stratum 1 Alignment Tolerance Cross-section Pad - Stratum 2 • Vertical interconnect pitch must be greater than alignment tolerance. • Demonstrated alignment tolerance : 3 microns.
Limitations • Restrictions placed by density of vertical interconnects may require increased area. • For frequency optimization, required alignment tolerance is 0.34 microns. • Via aspect ratio may also add limitations on vertical wiring density.
Outline • Motivation • 3D Architecture Concepts • Derivation of 3D Model • Results of Model • Optimization of Interconnects • Wiring Density Limitations • Conclusions
Conclusions • A new model has been derived for interconnect distributions in 2D and 3D architectures. • 14x increase in wire-limited clock frequency, • 92% reduction in wire-limited area, • or 50 % reduction in metal levels for 3D system. • Restrictions on vertical interconnect density may compromise the advantages of 3D architectures.