Understanding Diodes: Operation, Characteristics, and Semiconductor Basics
This guide provides an in-depth look at diodes, including the fundamental concepts of semiconductors, doping, and their operational principles. It covers n-type and p-type semiconductors, explains the structure and functioning of silicon diodes in both forward and reverse bias conditions, and explores relevant examples. Through an overview of semiconductor basics, intrinsic and extrinsic carriers, and the characteristics of the depletion region, this resource serves as an essential reference for engineering students and professionals seeking to enhance their understanding of diode technology.
Understanding Diodes: Operation, Characteristics, and Semiconductor Basics
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Presentation Transcript
Semiconductors • Doping concept • n & p-type semiconductors • Si diode • Forward & reversed bias • Examples • Diode Characteristic Engineer-In-Training Reference Manual Chapter 10: Diodes http://www.amazon.com/Engineer-Training-Reference-Michael-Lindeburg/dp/0912045566
Outline • Motivation and Goals • Semiconductor Basics • Diode Structure • Operation • Static model
Atom • Composed of 3 Basic particles: • Protons, Electrons & Neutrons. • An Atom requires balance, an equal No. of Protons & Electrons. • When an atom has one more particle (protons or electrons) it acquires a charge: • + Ion has more Protons than Electrons, • - Ion has more Electrons than Protons.
Semiconductor Basics I • Electrons in intrinsic (pure) Silicon • covalently bonded to atoms • “juggled” between neighbors • thermally activated: density eT • move around the lattice, if free • leave a positively charged `hole’ behind http://www.masstech.org/cleanenergy/solar_info/images/crystal.gif
Semiconductor Basics II • Two types of intrinsic carriers • Electrons (ni) and holes (pi) • In an intrinsic (no doping) material, ni=pi • At 300K, ni=pi is low (1010cm-3) • Use doping to improve conductivity
Semiconductor Basics III • Extrinsic carriers • Also two types of dopants (donors or acceptors) • Donors bring electron (n-type) and become ive ions • Acceptors bring holes (p-type) and become ive ions • Substantially higher densities (1015cm-3) • Majority and minority carriers • if n>>p (n-type) electrons majority and holes minority • Random recombination and thermal generation
Conduction • Conductor; • Has loosely bound electrons in its outer or Valence ring, • they are easily displaced. • Insulator; • Has tightly bound electrons in its outer or Valence ring, • they cannot be easily displaced. • Semiconductor; • Has at least 4 electrons in the outer or Valence ring, it is neither a conductor nor an insulator. • In its pure state it makes a better insulator than conductor. 4 electrons allows easy bonding w/ other materials.
Semiconductor Basics I • Electrons in intrinsic (pure) Silicon • covalently bonded to atoms • “juggled” between neighbors • thermally activated: density eT • move around the lattice, if free • leave a positively charged `hole’ behind
Semiconductor Basics II • Two types of intrinsic carriers • Electrons (ni) and holes (pi) • In an intrinsic (no doping) material, ni=pi • At 300K, ni=pi is low (1010cm-3) • Use doping to improve conductivity • Extrinsic carriers • Also two types of dopants (donors or acceptors) • Donors bring electron (n-type) and become ive ions • Acceptors bring holes (p-type) and become ive ions • Substantially higher densities (1015cm-3) • Majority and minority carriers • if n>>p (n-type) electrons majority and holes minority • Random recombination and thermal generation
B A Al SiO 2 p n Cross section of pn-junction in an IC process P-type region doped with acceptor impurities (boron) N-type region doped with donor impurities (phosphorus, arsenic) The Diode
The pn region is assumed to be thin (step or abrupt junction) A Al A p n Different concentrations of electrons (and holes) of the p and n-type regions cause a concentration gradient at the boundary B B One-dimensional representation diode symbol The Diode Simplified structure
hole diffusion electron diffusion p n hole drift electron drift Depletion Region • Concentration Gradient causes electrons to diffuse from n to p, and holes to diffuse from p to n • This produces immobile ions in the vicinity of the boundary • Region at the junction with the charged ions is called the depletion region or space-charge region • Charges create electric field that attracts the carriers, causing them to drift • Drift counteracts diffusion causing equilibrium ( Idrift = -Idiffusion )
Depletion Region • Zero bias conditions • p more heavily doped than n (NA > NB) • Electric field gives rise to potential difference in the junction, known as the built-in potential
hole diffusion electron diffusion p n hole drift electron drift + - Forward Bias • Applied potential lowers the potential barrier, Idiffusion > I drift • Mobile carriers drift through the dep. region into neutral regions • become excess minority carriers and diffuse towards terminals
hole diffusion electron diffusion p n hole drift electron drift - + Reverse Bias • Applied potential increases the potential barrier • Diffusion current is reduced • Diode works in the reverse bias with a very small drift current
Diode Current Ideal diode equation: