'10 nm' diaporamas de présentation

Semiconductor sensitized solar cells . DSSC 的缺點. 染料 : dye 只能吸收一部分的太陽光譜 (dye:350-750 nm, 太陽光 350-2500 nm). 電解液 : I 離子具腐蝕性，液體怕漏 光電子會 recombination ，降低電池之電流及效率。. 染料為有機物 (organic) ，遇高溫會破壞 有機物長時間穩定性較差，壽命問題 電解液為碘液體，有腐蝕性，降低壽命。. Semiconductor 為無機物， 熔點高 ，長期穩定 無機物比較不怕電解液 腐蝕

LYRA Tests and Calibration. LYRA Meeting Davos 05/06 Oct 2006. Contents. I. From Model to Configuration II. BESSY Campaigns a. Flux Linearity b. Stability, Drift c. LEDs, Dark Current d. Spectral Responsivity e. Homogeneity, Flatfield f. Cadence, Response Time

Announcements. Lec. 13 : SHREC, SHRIMP, PALM and STORM Enhancing Resolution. I will be here on Wed. Unclear whether we’ll have special lecture by Klaus Schulten on magnetic orientation. Kinesin. (HHMI/Harvard). FIONA. F luorescence I maging with O ne N anometer A ccuracy. SHREC.

Lecture 3: Aerosol processes. Ken Carslaw. The aerosol lifecycle. transport. < months. Nucleation. Low vapor pressure. Free troposphere. Growth. oxidation. coagulation. Vertical transport. hours/days. Dissolution. Wet scavenging. Precursor gases. CCN. insoluble. Ageing/growth.

Lead Fluxes. Andreas Held, Caroline Leck, Ian Brooks, Barbara Brooks, Sarah Norris. Simplified Arctic Aerosol Life Cycle. cloud albedo. scattering & absorption. CCN. TRANSFORMATION. WET DEPOSITION. TRANSPORT. DRY DEPOSITION. SOURCES. surface albedo.

LYRA Tests and Selections. SCSL Meeting Bern 29 Nov - 01 Dec 2006. Contents. I. From Model to Configuration II. BESSY Campaigns a. Flux Linearity b. Stability, Drift c. LEDs, Dark Current d. Spectral Responsivity e. Homogeneity, Flatfield III. Summary.

Growing-Up under Dr. Chance as Mentor and Thereafter: Near Infrared and Nanometal Particles for Molecular Imaging/Cancer Treatment. Kyung A. Kang Department of Chemical Engineering University of Louisville. Britton Chance Symposium June 3-4, 2011. Working for Dr. Chance.

Announcements. Lec. 13 : SHREC, SHRIMP, PALM and STORM Enhancing Resolution. I will be here on Wed. Unclear whether we’ll have special lecture by Klaus Schulten on magnetic orientation. Kinesin. (HHMI/Harvard). FIONA. F luorescence I maging with O ne N anometer A ccuracy. SHREC.

Metrology Roadmap 4 - 05. Europe Rien Stoup (PAN Analytical) Dick Verkley (FEI- Philips) Mauro Vasconi (ST) Japan Atsuko Yamaguchi (Hitachi) Korea Chin Soobok (Samsung) Mann-Ho Cho (KRISS) Taiwan J.H. Sheih (TSMC) US Jack Martinez (NIST)

Inorganic Phosphors and ACTFEL Devices on Flexible Plastic Substrates. J. P. Bender and J. F. Wager Department of Electrical Engineering and Computer Science http://ece.oregonstate.edu/matdev S. Park, B. L. Clark, and D. A. Keszler Department of Chemistry Oregon State University

Stephan Borrmann Kathy Law (Univ. Paris-Jussieu) Daniel Kunkel, Joachim Curtius (Univ. of Mainz and MPIC) Ralf Weigel (Univ. Clermont-Ferrand) Silvia Viciani (INOA, Florence) G. Shur, A. Ulanovsky (CAO, Moscow, Russia).

Metric System Prefixes. “Yes, I got you ten roses. I believe that the strongest relationships are based on the metric system.”. Mike Jones Pisgah High School Canton NC. Revised 020211. Metric System Prefixes. mega- kilo- deci- centi- milli- micro- nano- pico- .

Part 3iii: Scanning Near-Field Photolithography (SNP). Learning Objectives. After completing PART 3iii of this course you should have an understanding of, and be able to demonstrate, the following terms, ideas and methods. The photo-oxidation process of thiolates to sulfonates on gold,

Fludioxonil. Fenhexamid. Supplemental Figure 1: Chemical structures of fludioxonil and fenhexamid. 23. 23. RNU38. RNU48. 22. 22. 21. 21. CT value. CT value. 20. 20. 19. 19. 18. 18. 17. 17. DMSO. 100nM Flu. 100nM Fen. DMSO. 100nM Flu. 100nM Fen. 22. 17. GAPDH. 18S. 21.

Nanomaterials: An Overview of Concepts, Developments and Promises. T.P.Radhakrishnan School of Chemistry, University of Hyderabad Hyderabad 500 046, India tprsc@uohyd.ernet.in http://chemistry.uohyd.ernet.in/~tpr/. This file is available at http://chemistry.uohyd.ernet.in/~ch521/.

Laser-Assisted Direct Imprint (LADI) Technology. S. Y. Chou , C. Keimel, and J. Gu, Ultrafast and direct imprint of nanostructures in silicon, Nature , 417 (2002) 835-837. Yingqi Jiang. Outline. Fabrication process Experimental results Technology features Quartz mould Laser beam fluence

Mechanisms of ferromagnetic ordering and anomalous Hall effect in 2D GaAs/InGaAs/GaAs structures with Mn delta layer. Rylkov V.V. Lagutin A.S. Davydov A.B. Pankov M.A. Meilikhov E.Z. Pashaev E.M. Zvonkov B.N. Danilov Yu. A. Vikhrova O.V. Laiho R. Lashkul A. Kulbachinskii V.A.

NANOTECHNOLOGY: What Is It? Are There Associated Environmental Concerns?. Michael D. Gill US EPA ORD Hazardous Waste Technical Liaison to Region 9. Environmental Technology Council Seminar Series December 2, 2004. Research and Development at EPA. 1,950 employees $700 million budget

Metric System Prefixes. “Yes, I got you ten roses. I believe that the strongest relationships are based on the metric system.”. Mike Jones Pisgah High School Canton NC. Revised 021012. Metric System Prefixes. mega- kilo- deci- centi- milli- micro- nano- pico- .

Future Developments. A. Müller German Aerospace Center. Content. Technology Trends in Application Campaigns and Applications in Europe GMES & Imaging Spectroscopy? EnMAP. Technology. Scan Principles. Dispersive Element (e.g. Grating). Dispersive Element (e.g. Prism).