'Beam lithography' diaporamas de présentation

Forming Nanostructures by the Top-Down Approach

Forming Nanostructures by the Top-Down Approach. Photolithography and Microelectronics: Limitations Nanolithography: Electron Beam Lithography Scanning Near-Field Photolithography Soft Lithography: Chemically Printing on Surfaces

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Fabrication in the nanoscale: principles, technology and applications

Fabrication in the nanoscale: principles, technology and applications . Textbook: Nanofabrication: principles, capabilities and limits, by Zheng Cui Course instructor: Bo Cui Office: EIT 4012 Ext. 38754 Office hour: 11-12pm, Monday & Thursday.

910 views • 47 slides

Fabrication in the nanoscale: principles, technology and applications

Fabrication in the nanoscale: principles, technology and applications . Textbook: Nanofabrication: principles, capabilities and limits, by Zheng Cui Course instructor: Bo Cui Office: EIT 4012 Ext. 38754 Office hour: 11-12pm, Monday & Thursday.

618 views • 47 slides

Focused ion beam (FIB)

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Scanning probe microscopy (SPM) and lithography

Scanning probe microscopy (SPM) and lithography. Atom and particle manipulation by STM and AFM. AFM oxidation of Si or metals. Dip-pen nanolithography (DPN). ECE 730: Fabrication in the nanoscale : principles, technology and applications

1.02k views • 39 slides

Electrical characteristic of carbon nanowires produced by oxidative shrinking

493 views • 37 slides

Lateral Asymmetric Channel (LAC) Transistors

Lateral Asymmetric Channel (LAC) Transistors. Asymmetrically doped channel; heavier doping near source Improved characteristics Better DIBL Velocity overshoot Improved hot-carrier performance Disadvantage: Design difficult. Fabrication - LAC Transistors.

631 views • 27 slides

Dr Androula Nassiopoulou Director

Institute of Microelectronics NCSR Demokritos. Dr Androula Nassiopoulou Director. Ministry of Development. ORGANIZATIONAL STRUCTURE OF NCSR DEMOKRITOS. General Secretariat for Research and Technology. NCSR DEMOKRITOS. Central administration. Department for Technical Support.

360 views • 25 slides

International Symposium on Compound Semiconductors 2012

International Symposium on Compound Semiconductors 2012. InGaAs/InP DHBTs with Emitter and Base Defined through Electron-beam Lithography for Reduced C cb and Increased RF Cut-off Frequency.

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InGaAs/InP DHBTs with Emitter and Base Defined through Electron-beam Lithography for Reduced C cb and Increased RF C

International Symposium on Compound Semiconductors 2012. InGaAs/InP DHBTs with Emitter and Base Defined through Electron-beam Lithography for Reduced C cb and Increased RF Cut-off Frequency.

475 views • 23 slides

Nanotechnology: Applications, Impacts, Challenges, and Trends

Nanotechnology: Applications, Impacts, Challenges, and Trends. Joe Kostkowski Dan McDonald April 29, 2005. Applications and Impacts. Applications and Impacts Energy. energy efficiency and supply provide food and water worldwide dwindling fossil-fuel reserves solar power Batteries

402 views • 18 slides

Search for FQHE in graphene

Search for FQHE in graphene. John Watson, Sumit Mondal , Robert Niffenegger 4/29/09. Outline. Integer Quantum Hall Effect Semiconductor Graphene Fractional Quantum Hall Effect Theoretical Expectations for FQHE in Graphene Proposed Experiments Suspended Graphene

374 views • 18 slides

Functional Metal Oxide Nanobelts: From Materials to Nanodevices

549 views • 17 slides

X-ray Lithography

X-ray Lithography. physical synthesis of nanostructures. 20 nm. Scott Allen Physics Department University of Guelph. 60 nm. Chen et al., Electrophoresis, 2001 . Outline. What is lithography?. What are x-rays?. x-ray lithography (XRL). production of x-rays. x-ray interactions. mask.

3.63k views • 16 slides

Quantum mechanics unit 1

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Quantum mechanics unit 1

267 views • 14 slides

Nanolithography

Nanolithography. Lecture 15 G.J. Mankey gmankey@mint.ua.edu. Writing and Printing. To go far beyond the Raleigh limit of optical processes, other probes must be applied.

256 views • 11 slides

Yat Li Department of Chemistry & Biochemistry University of California, Santa Cruz

CHEM 146C_Experiment #7 Soft Lithography: Patterning. Yat Li Department of Chemistry & Biochemistry University of California, Santa Cruz. Objective. In this laboratory experiment, we will learn: . The principle of soft lithography and the fabrication of poly(dimethylsiloxane) (PDMS) stamp

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M S El Bana 1, 2* and S J Bending 1

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Design and Fabrication of Computer-Generated Holograms for Fresnel Domain Lithography

276 views • 1 slides