'Pmma' diaporamas de présentation

Quantum Lithography

559 views • 27 slides

Quantum Lithography

310 views • 27 slides

Chemical engineering products, processes, and challenges

Chemical engineering products, processes, and challenges. Commodities Molecules Nanostructures Key cost speed to market function Basis unit operations discovery properties. A commodity: TiO 2 (titanium oxide).

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411 views • 21 slides

Experimental study of beam hardening artefacts in photon counting breast computed tomography

Experimental study of beam hardening artefacts in photon counting breast computed tomography. M.G. Bisogni a , A. Del Guerra a ,N. Lanconelli b , A. Lauria c , G. Mettivier c , M.C. Montesi c , D. Panetta a , R. Pani d , M.G. Quattrocchi a , P. Randaccio e , V. Rosso a , P. Russo c

332 views • 14 slides

Experimental study of beam hardening artefacts in photon counting breast computed tomography

Experimental study of beam hardening artefacts in photon counting breast computed tomography. M.G. Bisogni a , A. Del Guerra a ,N. Lanconelli b , A. Lauria c , G. Mettivier c , M.C. Montesi c , D. Panetta a , R. Pani d , M.G. Quattrocchi a , P. Randaccio e , V. Rosso a , P. Russo c

161 views • 14 slides

Looking for single ion impacts in PMMA Victoria Millar David Hoxley Chris Pakes

Looking for single ion impacts in PMMA Victoria Millar David Hoxley Chris Pakes Steven Prawer. Why? Top down process utilises ion implantation for the placement of P ions in the silicon substrate. Ion implantation is essentially random.

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Activation Energy of PMMA

One can analyze the time dependent creep modulus of PMMA in terms of an effective activation energy. In the example on the left, I picked an E(t) of 6.81E9 dynes/cm 2 . That one conveniently intersects the 60,80,92, 110, and 112 o C curves.

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Nanoimprint Lithography

Nanoimprint Lithography. Silicon Mold PMMA Metal Substrate.

355 views • 1 slides

Electron Beam

Electron Beam Lithography and Nanofabrication. Exposure. Electron Beam. High M M PMMA Low M M PMMA Indium Tin Oxide Glass. Bilayer e-beam resist structure. A high molecular weight PMMA is spun on top of a slightly more sensitive bottom layer of low melecular weight PMMA. Development.

604 views • 1 slides