Nanoimprint Lithography

Sep 14, 2014

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Nanoimprint Lithography. Silicon Mold PMMA Metal Substrate.

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Nanoimprint Lithography

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Nanoimprint Lithography Silicon Mold PMMA Metal Substrate

Lithography

Lithography. Lithography in the MEMS context is typically the transfer of a pattern to a photosensitive material by selective exposure to a radiation source such as light.

1.03k views • 37 slides

Repeatability and control in nanoimprint lithography

Repeatability and control in nanoimprint lithography. Sarah Felix 4/14/08 EE C235 - Nanoscale Fabrication. Objective. Look at how lithography system components influence performance of nanoimprint lithography (NIL). Process overview. Parameters and cycle time. Translation speed, v t

431 views • 13 slides

Lithography

Paulo Moreira. Technology. 2. Lithography. Basic sequenceThe surface to be patterned is:spin-coated with photoresistthe photoresist is dehydrated in an oven (photo resist: light-sensitive organic polymer)The photoresist is exposed to ultra violet light:For a positive photoresist exposed areas become soluble and non exposed areas remain hardThe soluble photoresist is chemically removed (development).The patterned photoresist will now serve as an etching mask for the SiO2 .

479 views • 5 slides

NFF MA6 Nanoimprint Upgrade

Workshop for NFF Nanoimprint System. NFF MA6 Nanoimprint Upgrade . Workshop for NFF Nanoimprint System. Outline. Nanoimprint Lithography (NIL) Upgrade Parts. Workshop for NFF Nanoimprint System. Nanoimprint Lithography (NIL).

446 views • 16 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). Overview. Thermal NIL resists. Residual layer after NIL. NIL for large features (more difficult than small one). Room temperature NIL, reverse NIL, inking. NIL of bulk resist (polymer sheet, pellets).

1.02k views • 52 slides

SEM lithography

SEM lithography. Mason Overby 2/23/09. Outline. SEM (Scanning Electron Microscope) basics Why use SEM lithography Basic process for nanolithography How does this apply to carbon? Few extras…. SEM basics. Filament electron source Accelerated by variable potential “scanned”

610 views • 17 slides

Nanoimprint lithography (NIL)

1.47k views • 54 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). UV-curable NIL. Resists for UV-NIL. Mold fabrication for thermal and UV-NIL. Alignment. NIL into metals. NIL systems (air press, roller, roll-to-roll, EFAN…) NIL applications. ECE 730: Fabrication in the nanoscale : principles, technology and applications

1.03k views • 58 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). UV-curable NIL. Resists for UV-NIL. Mold fabrication for thermal and UV-NIL. ECE 730: Fabrication in the nanoscale : principles, technology and applications Instructor: Bo Cui, ECE, University of Waterloo; http://ece.uwaterloo.ca/~bcui/

1.1k views • 41 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). UV-curable NIL. Resists for UV-NIL. Mold fabrication for thermal and UV-NIL. Alignment. NIL into metals. NIL systems (air press, roller, roll-to-roll, EFAN…). ECE 730: Fabrication in the nanoscale : principles, technology and applications

3.18k views • 50 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). Overview. Thermal NIL resists. Residual layer after NIL. NIL for large features (more difficult than small one). Room temperature NIL, reverse NIL, NIL of bulk resist (polymer sheet, pellets). UV-curing NIL. Resists for UV-NIL.

702 views • 39 slides

Defect Analysis in Thermal Nanoimprint Lithography

Defect Analysis in Thermal Nanoimprint Lithography. Yoshihiko Hirai, Satoshi Yoshida, and Nobuyuki Takagi Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures , Vol. 21, No. 6, pp. 2765–2770, November 2003 Presentation by Chris Hannemann. Overview.

363 views • 10 slides

Direct Nanoimprint Lithography

Yongshik Park EE235 04/14/08. Direct Nanoimprint Lithography. Nanoimprint Lithography (1994). Prof. Stephen Y. Chou. Imprint mold with 10nm diameter pillars. 10nm diameter holes imprinted in PMMA. 10nm diameter metal dots fabricated by NIL.

572 views • 14 slides

First Nano-wire FinFETs via UV-based Nanoimprint Lithography

First Nano-wire FinFETs via UV-based Nanoimprint Lithography. Nanowire fin field effect transistors via UV-based nanoimprint lithography * A. Fuchs,a M. Bender, U. Plachetka, L. Kock, T. Wahlbrink, H. D. B. Gottlob, J. K. Efavi,

488 views • 11 slides

NANO-Lithography

NANO-Lithography. Name : DEKONG ZENG EE235 Spring 2007. Recent progress in high resolution lithography Daniel Bratton, Da Yang, Junyan Dai and Christopher K. Ober* Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA. All material gathered from Public Domain.

618 views • 19 slides

Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography

Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography. Authors: Sang Hoon Kim, Ki-Dong Lee, Ja-Yeon Kim, Min-Ki Kwon and Seong-Ju Park Presented by Darsen Lu (3/19/2007). Outline. Introduction Some background Information Mold Fabrication

842 views • 19 slides

Lithography

Lithography. By: Ryan Levin. Lithography Overview. Optical Lithography has been the main method for manufacturing. Optical Lithography is expected to continue as such until 45nm through techniques such as; OAI, PSM, and OPC. The 32nm node is viewed as beyond the scope of optical lithography.

524 views • 7 slides

Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography

NANO LETTERS 2006 Vol. 6, No. 3 351 - 354. Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography.

303 views • 17 slides

Lithography

Lithography. Topics: Wafer exposure systems Photoresists Manufacturing Methods & Equipment Measurement Methods. Projected Lithography Requirements. Projection systems. Proximity Printing : Mask/wafer separated 5-25 m m Separation results in poor resolution

667 views • 27 slides

Air bubble formation and dissolution in dispensing nanoimprint lithography

Air bubble formation and dissolution in dispensing nanoimprint lithography. Xiaogan Liang, Hua Tan, Zengli Fu, and Stephen Y Chou. Nanotechnology, 17 Jan 2007. William Casper-Ortiz Mechanical Engineering Dept. UC Berkeley. Significance.

360 views • 11 slides

Quantum Lithography

Quantum Lithography. Robert Boyd, Sean Bentley * , Hye-Jeong Chang, Heedeuk Shin, Malcolm O’Sullivan-Hale and Kam Wai Chan Institute of Optics, University of Rochester, Rochester, NY * Department of Physics, Adelphi University, Garden City, NY Girish Agarwal

321 views • 27 slides

Lithography

753 views • 7 slides

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