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Beam Position Monitor for FP420

Beam Position Monitor for FP420. Integration in alignment test-bench HH 18-05-06. Electrostatic PU. Courtesy L. Soby. Electrostatic PU. Courtesy L. Soby.  50 μ m. Electrostatic PU. Courtesy L. Soby. Test PU Mechanics. Micro Positioner. PU layout.

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Beam Position Monitor for FP420

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  1. Beam Position Monitor for FP420 Integration in alignment test-bench HH 18-05-06

  2. ElectrostaticPU Courtesy L. Soby D. Swoboda @ FP420 HH

  3. Electrostatic PU Courtesy L. Soby  50 μm D. Swoboda @ FP420 HH

  4. Electrostatic PU Courtesy L. Soby D. Swoboda @ FP420 HH

  5. Test PU Mechanics D. Swoboda @ FP420 HH

  6. Micro Positioner D. Swoboda @ FP420 HH

  7. PU layout • PU electrodes are outside vac pipe aperture. • No impact on acceptance. • Custom design & manufacturing required. • New design  ~ 4 – 6 months • Manufacturing  ~ 3 – 6 months • No iteration (prototype) D. Swoboda @ FP420 HH

  8. PU DAQ chain • FEE, i.e high impedance to 50 ohm buffers • Needed: RO chain • > 12 bit FADC • software for position calculations • difference over sum, multiplied by a scaling factor and offset subtraction (LabView)? D. Swoboda @ FP420 HH

  9. BPM status • Calibration precision ~ 100 μm in lab • 2 PUs available • Some electronics available • Appl SW available (LabView) D. Swoboda @ FP420 HH

  10. Calibration requirements • Fix simulation current track(s) in PCB machined w/reference face • Need alignment and positioning system. • Encapsulate signal wire(s) in PCB • Several (3 +) wires in parallel grooves can be used to simulate beam displacement D. Swoboda @ FP420 HH

  11. What is the precision? • Beam center vs detector (bunch/bunch) • Alignment resolution ~ 10 μm; i.e.: BPM + (BPM align. PU) + align. PU + align. System + (align. PU  detector) = overall precision D. Swoboda @ FP420 HH

  12. D/2 D/2 30 mm 30 mm Aperture Requirement D. Swoboda @ FP420 HH

  13. Alignment D. Swoboda @ FP420 HH

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