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Atomic Layer Deposition for Alumina Coating

CH 4. CH 3. CH 3. CH 3. CH 3. Al. Al. Al. Al. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. CH 3. Al. Al. Al. Al. OH. OH. OH. OH. OH. OH. OH. OH. OH. OH. OH. OH. OH. CH 4. H 2 O. H 2 O. OH. OH. CH 3. CH 3. Al.

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Atomic Layer Deposition for Alumina Coating

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  1. CH4 CH3 CH3 CH3 CH3 Al Al Al Al CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 CH3 Al Al Al Al OH OH OH OH OH OH OH OH OH OH OH OH OH CH4 H2O H2O OH OH CH3 CH3 Al Al Atomic Layer Deposition for Alumina Coating A: Al-OH* + Al(CH3)3 Al-O-Al-(CH3)2*+ CH4 Trimethyl Aluminum (TMA) A) Al(CH3)3 B: Al-CH3* + H2O  Al-OH* + CH4 Water B) H2O 1

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