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CMOS 半導體製程概念

CMOS 半導體製程概念. INVERTER. (a) field oxide etching. P-SUBSTRATE. Inverter Process Steps. N-WELL. P-SUBSTRATE. (b) N-well diffusion. Inverter Process Steps. N-WELL. P-SUBSTRATE. (c) field oxide etching. Inverter Process Steps. (d) gate oxidation. N-WELL. P-SUBSTRATE.

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CMOS 半導體製程概念

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  1. CMOS半導體製程概念 INVERTER

  2. (a) field oxide etching P-SUBSTRATE InverterProcess Steps

  3. N-WELL P-SUBSTRATE (b) N-well diffusion InverterProcess Steps

  4. N-WELL P-SUBSTRATE (c) field oxide etching InverterProcess Steps

  5. (d) gate oxidation N-WELL P-SUBSTRATE InverterProcess Steps

  6. (e) polysilicon definition N-WELL P-SUBSTRATE InverterProcess Steps

  7. (f) n-plus diffusion p+ p+ N-WELL P-SUBSTRATE InverterProcess Steps n+ n+

  8. p+ p+ n+ n+ N-WELL P-SUBSTRATE InverterProcess Steps (g) p-plus diffusion n+ n+ p+ p+

  9. (h) oxide growth p+ p+ n+ n+ N-WELL P-SUBSTRATE InverterProcess Steps n+ n+ p+ p+

  10. p+ p+ n+ n+ (i) contact cuts N-WELL P-SUBSTRATE InverterProcess Steps n+ n+ p+ p+

  11. (j) metal p+ p+ n+ n+ N-WELL P-SUBSTRATE InverterProcess Steps n+ n+ p+ p+

  12. Simplified CMOS Inverter Process cut line n well

  13. N-Well Mask

  14. Active Mask

  15. Poly Mask

  16. N+ Select Mask

  17. P+ Select Mask

  18. Contact Mask

  19. Metal Mask

  20. poly P substrate wafer Layout • Inverter佈局繪製動畫說明圖例 n well

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