1 / 23

Alloy Thin Films by Multi-Target Sputtering

Alloy Thin Films by Multi-Target Sputtering. Karla L. Perez MSE/REU Final Presentation Adv. Prof. King and Prof. Dayananda August 5, 2004. Overview. Introduction Research Project Processing Measuring Film Thickness Optical Microscope AFM Alloy Thin Film Deposition

radley
Télécharger la présentation

Alloy Thin Films by Multi-Target Sputtering

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. Alloy Thin Films by Multi-Target Sputtering Karla L. Perez MSE/REU Final Presentation Adv. Prof. King and Prof. Dayananda August 5, 2004

  2. Overview • Introduction • Research Project • Processing • Measuring Film Thickness • Optical Microscope • AFM • Alloy Thin Film Deposition • Composition • Conclusion

  3. Application of Thin Films • Antireflection coatings for camera lenses • Optical filters for communication • Decorative coatings on plastics • Silicon chips • Metallic coatings • To provide insulating layers between conductors

  4. Research Project • The main goal is to create alloy thin films with uniform composition and thickness • Study the compositions of pure metal thin films and their thickness • Pure metal components to be used: Ag, Cu, Ta, Mo, Ni, Fe, Ti • Design a system which will enable us to manage the composition and geometry of the alloy thin films

  5. Processing • Sputtering It is a type of Physical Vapor Deposition. It is carried out at high vacuum in a chamber connected to a high voltage DC supply. Argon gas is pumped into the chamber and creates argon plasma. The Argon plasma is directed to the target and its atoms are vaporized. The vaporized material is then deposited on the substrate.

  6. Measuring Film Thickness • Optical Microscope • Differential Interference Contrast (DIC) Ag 20min 4cm

  7. Measuring Film ThicknessOptical Microscope Cu 10min 4cm Ag 20min 4cm

  8. Measuring Film ThicknessOptical Microscope Ag 10 min 4cm Ag 20min 4cm

  9. Measuring Film Thickness • Atomic Force Microscope (AFM) • Tapping mode: Measures the topography by tapping the surface with an oscillating tip. This eliminates the shear forces which can damage soft samples and reduce image resolution.

  10. Measuring Film Thickness

  11. Measuring Film ThicknessAFM Ag 20min 2cm

  12. Measuring Film ThicknessAFM Mo 30min 2cm

  13. Measuring Film ThicknessAFM Cu 30min 2cm

  14. Ag 30min 2cm 52.40 14.19

  15. Deposit alloy thin films using a sputter coater with a Copper-Silver target Alloy Thin Film Deposition

  16. Composition of Ag-Cu Thin Film 92.7% 50.3% 7.3% Position on slide

  17. Composition of Ag-Cu Thin Film 95.6% 50.3% 4.4% Position on slide

  18. Conclusion • The thickness of the film varies according to their position relative to the target. • Films deposited are thicker in the middle. • Deposited one alloy thin film • The same composition gradients of silver and copper do not occur in the middle of the film.

  19. Acknowledgements • Prof. King • Prof. Dayananda • Prof. Kvam • NSF Grant

  20. Questions??? Thank you!!!

More Related