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On-wire Lithography

On-wire Lithography. Lidong Qin, Sungho Park, Ling Huang, Chad A. Mirkin July 1, 2005. Outline. Moore’s Law Current Nano Lithography methods On-wire lithography Applications Conclusion. Current Lithography methods. Election beam lithography Dip-pen nano lithogrphy

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On-wire Lithography

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  1. On-wire Lithography Lidong Qin, Sungho Park, Ling Huang, Chad A. Mirkin July 1, 2005

  2. Outline • Moore’s Law • Current Nano Lithography methods • On-wire lithography • Applications • Conclusion

  3. Current Lithography methods • Election beam lithography • Dip-pen nano lithogrphy • Focused ion beam lithography • Nanoimprinting lithography These methods are limited by: Throughput, material compatibility, resolution, and cost

  4. On-wire Lithography • Nanowires with gaps as small as 2.5 nm • High throughput • Based on template-directed synthesis of nanowires with electrochemical deposition and wet-chemical etching

  5. Process

  6. Applications • Photonic devices • Plasmon waveguides • Electrical devices • Chemical sensors • Biological sensors

  7. Conclusion • Remarkably controllable • High yield • Easy implementation • No expensive equipment • Allows for manipulation of nanowires

  8. Thank you

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