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N.A. Microlithography TC Chapter Liaison Report - October 2014

This report provides updates on task force and leadership changes, committee structure, meeting information, document review summary, and new activities of the N.A. Microlithography Technical Committee.

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N.A. Microlithography TC Chapter Liaison Report - October 2014

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  1. North America Microlithography Technical Committee Chapter Liaison Report October 2014

  2. Outline • Task Force and Leadership Changes • Leadership • Current Committee Structure • Meeting Information • Document Review Summary • New Activities • Technical Ballots to be Reviewed • Task Force Updates

  3. Task Force and Leadership Changes • None.

  4. Leadership • N.A. Microlithography TC Chapter Co-chairs • Wes Erck / Wes Erck & Associates • Rick Silver / NIST

  5. Microlithography TC Chapter Structure

  6. Meeting Information • Last meeting • SEMICON West 2013July 9th • San Francisco Marriott Marquis Hotel in San Francisco, California • Next meeting • Virtual Meeting via teleconference and webmeeting • Date to be determined sometime in Fall 2014

  7. Document Review Summary • None.

  8. New Activities • None.

  9. Task Force Updates • There were no new updates from the Task Forces • The committee will focus on documents due for five year review

  10. Five-year Review Status [1/3] (previous updates in blue)

  11. Five-year Review Status [2/3] (previous updates in blue)

  12. Five-year Review Status [3/3] (previous updates in blue)

  13. Thank You! For more information or to participate in any N.A. Microlithography activities, please contact Michael Tran at SEMI (mtran@semi.org)

  14. Back-up NA Microlithography Report - December 2011

  15. SEMI P10 Patent Review WG • P10 Patent Review Working Group reviewed over 80 patent and patent applications • 80 from Photronics, 4 from Toppan (formerly DuPont) • Review period: December 15, 2009 through June 2, 2010 (~14 WG meetings held via teleconference) • WG members comprised of P10 TF members and/or P10 users • Patent review working group discussed and analyzed: • Potential materiality of the Photronics and Toppan patents to the SEMI P10 standard NA Microlithography Report - December 2011

  16. P10 Patent Review WG Review Results • Of the 80 Photronics patents/patent applications, 10 were found to be potentially material and justified on technical grounds • Of the four (4) Toppan patent patents, three (3) were found to be potentially material and justified on technical grounds NA Microlithography Report - December 2011

  17. Task Force Updates [continued] • Mask Orders (P10) TF • Discussing possible interest/activity on foundry orders • Intellectual Property previously identified as relevant to P10 • The NA Microlithography found, per the P10 Patent Review WG recommendations, 10 patents/patent applications from Photronics and 3 patents from Toppan as potentially material to SEMI P10 and that their use is justified on technical grounds • LOA (letter of assurance) requests sent by SEMI staff to IP holders • LOA response from Photronics has been received, awaiting response from Toppan NA Microlithography Report - December 2011

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