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Before. After. Nanolithography using DI Nanolithography Software for Explorer. PMMA C6 spun at 4000 RPM onto a Si(100) Substrate: thickness ~ 200 nm Baked at 115 o C for 30 seconds Pattern scratched onto surface: Previously used NSC A tip did the actual writing T-B ~ -5 nA, Setpoint = 5 nA
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Before After Nanolithography using DI Nanolithography Software for Explorer • PMMA C6 spun at 4000 RPM onto a Si(100) Substrate: thickness ~ 200 nm • Baked at 115oC for 30 seconds • Pattern scratched onto surface: • Previously used NSC A tip did the actual writing • T-B ~ -5 nA, Setpoint = 5 nA • With feedback off, a relative z offset of 100 nm was added to the z scanner to move the tip closer to the surface • Write speed was 1mm/s
