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“ Polymer Pen” Nanolithography

NSE 203. “ Polymer Pen” Nanolithography. J. Wu Phys. Dept. references: Fengwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, and Chad A. Mirkin Science, 321 , 1658 (2008). An old wisdom: Dip-Pen technology. On Jan, 1999.

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“ Polymer Pen” Nanolithography

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  1. NSE 203 “Polymer Pen” Nanolithography J. Wu Phys. Dept. references: Fengwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, and Chad A. Mirkin Science, 321, 1658 (2008).

  2. An old wisdom: Dip-Pen technology On Jan, 1999 More than 4000 years ago… Pen Ink Patterns Substrate Dip-pen lithography is straightforward. Any draw back?

  3. Dip-pen lithography ? E-beam lithography Ion-beam lithography Serial replication Lithography: Photolithography Contact printing Nanoimprint lithography Parallel replication Advantage: Time effective, economic

  4. The secret: multi-identical-pens ~11,000,000 pens

  5. Second Advantage: size controllable Chinese calligraphy Pattern size controlled by the pressure on polymer.

  6. Massive production of patterns 2008 Beijing Olympic logo The total time required is less than 40 mins.

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