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Local workshop on e-beam lithography and related

Local workshop on e-beam lithography and related. QEPL/Chalmers May 9, 2003. Agenda. Drawing software AutoCAD Conversion (Alexi) Multiple current lithography and alignment strategies Other: CASINO software: the scattering of electrons by matter (Serge)

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Local workshop on e-beam lithography and related

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  1. Local workshop on e-beam lithography and related QEPL/Chalmers May 9, 2003

  2. Agenda • Drawing software • AutoCAD • Conversion (Alexi) • Multiple current lithography and alignment strategies • Other: • CASINO software: • the scattering of electrons by matter (Serge) • MgB2 vs YBCO: a nice case of substrate dependant dose (Serge) • Proximity effect simulations (Serge)

  3. Common references • From the SNL webpages • http://fy.chalmers.se/assp/snl/ • JEOL_EXPRESS_Manuals • Lithography operation guide • BEAM 4TH • BEAM 5TH • Others: • JEOL-EOS-tables.pdf

  4. From users • References from S. Charlebois • Serge’s notes EBL and using AutoCAD • Serge's references for students • Multi-chip holder sketch • JEOL Cassette • References from other users? • JEBCAD: • To have default colors for various doses, place this script in the root directory JEBCAD_INITIAL.COMMAND

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